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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
CPM |
2014-10-24 15:40 |
Nagano |
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Growth of 3C-SiC films on graphite by HW-CVD method Katsuya Abe, Takahiro Nakamura, Kenta Ito, Kouki Suzuki (Shinshu Univ.) |
[more] |
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CPM |
2014-10-24 17:00 |
Nagano |
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Characterization of Cu-Al oxide films deposited by sputtering method using Cu/Al composit target Katsuya Abe, Kazuki Hayashida (Shinshu Univ.) |
[more] |
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CPM |
2013-10-25 11:00 |
Niigata |
Niigata Univ. Satellite Campus TOKIMEITO |
Low temperature growth and structural characterization for SiC films by HWCVD using filaments coated with SiC Katsuya Abe, Hayato Ozawa, Tomohiko Yamakami (Shinshu Univ.) CPM2013-105 |
[more] |
CPM2013-105 pp.59-62 |
CPM |
2012-10-27 09:10 |
Niigata |
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CuAlO2 film deposition by reactive sputtering using Cu/Al target prepared by Cold Spray method Takuya Yokomoto, Takashi Arai, Takayuki Kosaka, Kazuki Okajima, Tomohiko Yamakami, Katsuya Abe, Kazuhiko Sakaki (Shinshu Univ.) CPM2012-104 |
CuAlO2 film deposition was tried by reactive sputtering using Cu/Al targets
prepared by cold spray method.The Cu/Al ta... [more] |
CPM2012-104 pp.61-64 |
CPM |
2012-08-08 13:00 |
Yamagata |
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Growth pressure dependence of SiC films grown by HWCVD at low substrate temperature Katsuya Abe, Takuu Syu, Tomohiko Yamakami (Shinshu Univ.) CPM2012-33 |
[more] |
CPM2012-33 pp.1-4 |
ED, SDM, CPM |
2012-05-18 10:50 |
Aichi |
VBL, Toyohashi Univ. of Technol. |
Low temperature crystallization of SiC films by metal induced growth technique Katsuya Abe, Ryohei Ushikusa, Yuya Sakaguchi, Takuu Syu, Tomohiko Yamakami (Shinshu Univ.) ED2012-30 CPM2012-14 SDM2012-32 |
[more] |
ED2012-30 CPM2012-14 SDM2012-32 pp.63-66 |
CPM |
2011-10-26 13:00 |
Fukui |
Fukui Univ. |
Structual characterization of CuAlO2 films deposited by reactive sputtering using composite target Takuya Yokomoto, Yosuke Maeda, Takumi Miyazawa, Tomohiko Yamakami, Katsuya Abe (SinshuUniv.) CPM2011-109 |
CuAlO2 films were prepared by reactive magnetron sputtering using Al-Cu hybrid targets
and these structural properties ... [more] |
CPM2011-109 pp.1-4 |
CPM |
2011-10-27 09:30 |
Fukui |
Fukui Univ. |
Growth of SiC films by HW-CVD using graphite filaments coated with SiC Yuya Sakaguchi, Ryohei Ushikusa, Takuu Syu, Tomohiko Yamakami, Katsuya Abe (Shinshu Univ) CPM2011-118 |
Silicon carbide films were prepared on p-Si(001) and glass substrates by hot-wire chemical vapor deposition
using grap... [more] |
CPM2011-118 pp.47-50 |
CPM |
2011-08-11 09:00 |
Aomori |
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Characterization of as-grown and annealed CuAlO2 films deposited by reactive sputtering Katsuya Abe, Takuya Yokomoto, Yosuke Maeda, Takumi Miyazawa (Shinshu Univ.) CPM2011-66 |
[more] |
CPM2011-66 pp.51-54 |
CPM |
2010-10-28 15:15 |
Nagano |
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Characterization of CuMO2 films grown by reactive sputtering Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.) |
[more] |
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CPM |
2010-10-29 09:00 |
Nagano |
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Low temperature growth of SiC films by HW-CVD using graphite filaments Yuya Sakaguchi, Hironori Nakamura, Jun Arima, Kazuhisa Moriyama, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.) CPM2010-99 |
Silicon carbide films were prepared on p-Si(001) and glass substrates by hot-wire chemical vapor deposition
using grap... [more] |
CPM2010-99 pp.43-46 |
CPM |
2010-07-29 13:30 |
Hokkaido |
Michino-Eki Shari Meeting Room |
Fabrication of CuInO2 thin films using RF sputtering and studies of annealing effects Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Tomohiko Yamakami, Katsuya Abe (Shinshu Univ.) |
[more] |
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CPM |
2009-10-29 15:50 |
Toyama |
Toyama Prefectural University |
Characterization of CuInO2 thin films grown by RF reactive sputtering Tsubasa Ogawa, Oki Kuraishi, Yoshitaka Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.) |
(To be available after the conference date) [more] |
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CPM |
2006-11-09 15:45 |
Ishikawa |
Kanazawa Univ. |
Reactive Sputter Deposition of AlN Film and Its Application to LD Submount Akihiro Shiono, Masahide Nakakuki, Isao Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe (Shinshu Univ.), Motoki Obata (CITIZEN FINE TECH), Katsuya Abe, Kiichi Kamimura (Shinshu Univ.) |
[more] |
CPM2006-118 pp.31-35 |
ED, CPM, LQE |
2006-10-06 16:00 |
Kyoto |
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Direct nitridation of SiC surface and characterization of nitride layer by XPS Tetsuo Yamaguchi, Yoshiki Ishida, Chen Chen, Masataka Hagihara, Rinpei Hayashibe, Tomohiko Yamakami, Katsuya Abe, Kiichi Kamimura (Shinshu Univ.) |
[more] |
ED2006-173 CPM2006-110 LQE2006-77 pp.113-116 |
CPM |
2005-11-11 15:10 |
Fukui |
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Characterization of insulating nitride films grown on 6H-SiC by plasma nitridation method Tetsuo Yamaguchi, YingShen Liu, Yoshiki Ishida, Tomohiko Yamakami, Rinpei Hayashibe, Katsuya Abe, Kiichi Kamimura (Shinshu Univ.) |
The quality of SiC-MOS devices has been critically limited by carbon related defects in the SiC oxide film grown by ther... [more] |
CPM2005-156 pp.25-28 |
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