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Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 16 of 16  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2014-10-24
15:40
Nagano   Growth of 3C-SiC films on graphite by HW-CVD method
Katsuya Abe, Takahiro Nakamura, Kenta Ito, Kouki Suzuki (Shinshu Univ.)
 [more]
CPM 2014-10-24
17:00
Nagano   Characterization of Cu-Al oxide films deposited by sputtering method using Cu/Al composit target
Katsuya Abe, Kazuki Hayashida (Shinshu Univ.)
 [more]
CPM 2013-10-25
11:00
Niigata Niigata Univ. Satellite Campus TOKIMEITO Low temperature growth and structural characterization for SiC films by HWCVD using filaments coated with SiC
Katsuya Abe, Hayato Ozawa, Tomohiko Yamakami (Shinshu Univ.) CPM2013-105
 [more] CPM2013-105
pp.59-62
CPM 2012-10-27
09:10
Niigata   CuAlO2 film deposition by reactive sputtering using Cu/Al target prepared by Cold Spray method
Takuya Yokomoto, Takashi Arai, Takayuki Kosaka, Kazuki Okajima, Tomohiko Yamakami, Katsuya Abe, Kazuhiko Sakaki (Shinshu Univ.) CPM2012-104
CuAlO2 film deposition was tried by reactive sputtering using Cu/Al targets
prepared by cold spray method.The Cu/Al ta... [more]
CPM2012-104
pp.61-64
CPM 2012-08-08
13:00
Yamagata   Growth pressure dependence of SiC films grown by HWCVD at low substrate temperature
Katsuya Abe, Takuu Syu, Tomohiko Yamakami (Shinshu Univ.) CPM2012-33
 [more] CPM2012-33
pp.1-4
ED, SDM, CPM 2012-05-18
10:50
Aichi VBL, Toyohashi Univ. of Technol. Low temperature crystallization of SiC films by metal induced growth technique
Katsuya Abe, Ryohei Ushikusa, Yuya Sakaguchi, Takuu Syu, Tomohiko Yamakami (Shinshu Univ.) ED2012-30 CPM2012-14 SDM2012-32
 [more] ED2012-30 CPM2012-14 SDM2012-32
pp.63-66
CPM 2011-10-26
13:00
Fukui Fukui Univ. Structual characterization of CuAlO2 films deposited by reactive sputtering using composite target
Takuya Yokomoto, Yosuke Maeda, Takumi Miyazawa, Tomohiko Yamakami, Katsuya Abe (SinshuUniv.) CPM2011-109
CuAlO2 films were prepared by reactive magnetron sputtering using Al-Cu hybrid targets
and these structural properties ... [more]
CPM2011-109
pp.1-4
CPM 2011-10-27
09:30
Fukui Fukui Univ. Growth of SiC films by HW-CVD using graphite filaments coated with SiC
Yuya Sakaguchi, Ryohei Ushikusa, Takuu Syu, Tomohiko Yamakami, Katsuya Abe (Shinshu Univ) CPM2011-118
Silicon carbide films were prepared on p-Si(001) and glass substrates by hot-wire chemical vapor deposition
using grap... [more]
CPM2011-118
pp.47-50
CPM 2011-08-11
09:00
Aomori   Characterization of as-grown and annealed CuAlO2 films deposited by reactive sputtering
Katsuya Abe, Takuya Yokomoto, Yosuke Maeda, Takumi Miyazawa (Shinshu Univ.) CPM2011-66
 [more] CPM2011-66
pp.51-54
CPM 2010-10-28
15:15
Nagano   Characterization of CuMO2 films grown by reactive sputtering
Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.)
 [more]
CPM 2010-10-29
09:00
Nagano   Low temperature growth of SiC films by HW-CVD using graphite filaments
Yuya Sakaguchi, Hironori Nakamura, Jun Arima, Kazuhisa Moriyama, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.) CPM2010-99
Silicon carbide films were prepared on p-Si(001) and glass substrates by hot-wire chemical vapor deposition
using grap... [more]
CPM2010-99
pp.43-46
CPM 2010-07-29
13:30
Hokkaido Michino-Eki Shari Meeting Room Fabrication of CuInO2 thin films using RF sputtering and studies of annealing effects
Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Tomohiko Yamakami, Katsuya Abe (Shinshu Univ.)
 [more]
CPM 2009-10-29
15:50
Toyama Toyama Prefectural University Characterization of CuInO2 thin films grown by RF reactive sputtering
Tsubasa Ogawa, Oki Kuraishi, Yoshitaka Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.)
(To be available after the conference date) [more]
CPM 2006-11-09
15:45
Ishikawa Kanazawa Univ. Reactive Sputter Deposition of AlN Film and Its Application to LD Submount
Akihiro Shiono, Masahide Nakakuki, Isao Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe (Shinshu Univ.), Motoki Obata (CITIZEN FINE TECH), Katsuya Abe, Kiichi Kamimura (Shinshu Univ.)
 [more] CPM2006-118
pp.31-35
ED, CPM, LQE 2006-10-06
16:00
Kyoto   Direct nitridation of SiC surface and characterization of nitride layer by XPS
Tetsuo Yamaguchi, Yoshiki Ishida, Chen Chen, Masataka Hagihara, Rinpei Hayashibe, Tomohiko Yamakami, Katsuya Abe, Kiichi Kamimura (Shinshu Univ.)
 [more] ED2006-173 CPM2006-110 LQE2006-77
pp.113-116
CPM 2005-11-11
15:10
Fukui   Characterization of insulating nitride films grown on 6H-SiC by plasma nitridation method
Tetsuo Yamaguchi, YingShen Liu, Yoshiki Ishida, Tomohiko Yamakami, Rinpei Hayashibe, Katsuya Abe, Kiichi Kamimura (Shinshu Univ.)
The quality of SiC-MOS devices has been critically limited by carbon related defects in the SiC oxide film grown by ther... [more] CPM2005-156
pp.25-28
 Results 1 - 16 of 16  /   
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