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Committee Date Time Place Paper Title / Authors Abstract Paper #
SS 2009-08-06
13:30		 Hokkaido Kitami Institute of Technology Incremental Feature Location Using Dynamic Slicing
Katsuyuki Sekine, Teruyoshi Zenmyo, Shinpei Hayashi, Motoshi Saeki (Tokyo Inst. of Tech.) SS2009-16		 To understand the behavior of a feature in the software maintenance process, identifying the location in which the featu... [more] SS2009-16
pp.25-30
ICD, SDM 2007-08-24
10:20		 Hokkaido Kitami Institute of Technology [Special Invited Talk] Effect of metal-gate/high-k on characteristics of MOSFETs for 32nm CMOS and beyond
Masato Koyama, Masahiro Koike, Yuuichi Kamimuta, Masamichi Suzuki, Kosuke Tatsumura, Yoshinori Tsuchiya, Reika Ichihara, Masakazu Goto, Koji Nagatomo, Atsushi Azuma, Shigeru Kawanaka, Kazuaki Nakajima, Katsuyuki Sekine (Toshiba Corp.) SDM2007-159 ICD2007-87		 In this paper, influences of metal-gate and high-k gate dielectric application on MOSFET (32nm node and beyond) characte... [more] SDM2007-159 ICD2007-87
pp.101-106
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