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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
EMT, EST, LQE, MWP, OPE, PEM, PN, IEE-EMT [detail] 2018-01-26
10:20
Hyogo   Design of wavefront control type WSS and fold-back type WSS using silicon waveguides
Fumi Nakamura, Hideaki Asakura, Kyosuke Muramatsu (Keio Univ.), Keijiro Suzuki, Ken Tanizawa, Minoru Ohtsuka, Nobuyuki Yokoyama, Kazuyuki Matsumaro, Miyoshi Seki, Keiji Koshino, Kazuhiro Ikeda, Shu Namiki, Hitoshi Kawashima (AIST), Hiroyuki Tsuda (Keio Univ.) PN2017-85 EMT2017-122 OPE2017-163 LQE2017-145 EST2017-121 MWP2017-98
A wavelength selective switch (WSS) is an optical device for routing the wavelength division multiplexed (WDM) signal to... [more] PN2017-85 EMT2017-122 OPE2017-163 LQE2017-145 EST2017-121 MWP2017-98
pp.275-280
OCS, OPE 2015-05-15
16:20
Tokyo Kikai-Shinko-Kaikan Bldg(Tokyo) 32x32 Strictly Non-Blocking Si-Wire Optical Path Switch
Ken Tanizawa, Keijiro Suzuki, Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, Kazuyuki Matsumaro, Miyoshi Seki, Keiji Koshino (AIST), Toshio Sugaya (Furukawa Electric), Satoshi Suda, Guangwei Cong (AIST), Toshio Kimura (Furukawa Electric), Kazuhiro Ikeda, Shu Namiki, Hitoshi Kawashima (AIST) OCS2015-8 OPE2015-8
In order to realize dynamic optical path networks that transmit coarse-granular video traffics with ultra-low energy con... [more] OCS2015-8 OPE2015-8
pp.33-38
LQE, OPE 2013-06-21
10:35
Tokyo   Silicon photonics devices on 300 mm wafer fabricated by using ArF immersion lithography
Tomohiro Kita, Yuichiro Tanushi, Masaki Nara, Syu Hirano (Tohoku Univ.), Munehiro Toyama, Miyoshi Seki, Keiji Koshino, Nobuyuki Yokoyama, Minoru Ohtsuka, Akinobu Sugiyama, Eiichi Ishitsuka, Tsukuru Sano, Tsuyoshi Horikawa (AIST), Hirohito Yamada (Tohoku Univ.) OPE2013-7 LQE2013-17
We have investigated optical characteristics of Si photonics devices formed on 300 mm SOI wafers by using ArF immersion ... [more] OPE2013-7 LQE2013-17
pp.1-5
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