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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2012-10-25 15:45 |
Miyagi |
Tohoku Univ. (Niche) |
AR-XPS and HAX-PES Studies on Chemical bonding states at SiO2/SiC Interfaces Hazuki Okada, Arata Komatsu, Masato Watanabe (Tokyo City Univ.), Yudai Izumi, Takayuki Muro (JASRI), Kentaro Sawano, Hiroshi Nohira (Tokyo City Univ.) SDM2012-90 |
(To be available after the conference date) [more] |
SDM2012-90 pp.5-9 |
SDM |
2012-06-21 13:35 |
Aichi |
VBL, Nagoya Univ. |
Surface Segregation Behavior of B, Ga, Sb, and As Dopant Atoms on Ge(100) and Ge(111) Examined with a First-principles Method Fumiya Iijima, Kentaro Sawano (TCU), Jiro Ushio (CRL), Takuya Maruizumi, Yasuhiro Shiraki (TCU) SDM2012-52 |
To understand surface segregation behaviour of B, Ga, As, and Sb dopant atoms on Ge (100) and Ge (111) surfaces, the pot... [more] |
SDM2012-52 pp.47-51 |
SDM |
2011-10-21 09:00 |
Miyagi |
Tohoku Univ. (Niche) |
[Invited Talk]
Study of HfO2/Si/strained-Ge/SiGe using Angle Resolved x-ray Photoelectron Spectroscopy Hiroshi Nohira, Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentaro Sawano (Tokyo City Univ.), M. Myronov (Univ. of Warwick), Yasuhiro Shiraki (Tokyo City Univ.) SDM2011-103 |
We have investigated the influence of Si-cap layer and the post deposition annealing (PDA) on compositional depth profil... [more] |
SDM2011-103 pp.37-41 |
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