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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 4 of 4  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2013-11-14
13:50
Tokyo Kikai-Shinko-Kaikan Bldg. Atomistic Study of Sulfur Diffusion and S2 Formation in Silicon during Low-temperature Rapid Thermal Annealing
Takahisa Kanemura, Koichi Kato, Hiroyoshi Tanimoto, Nobutoshi Aoki, Yoshiaki Toyoshima (Toshiba) SDM2013-102
Sulfur doping at NiSi/Si junction has been found to make a Schottky barrier height ultimately small, revealing almost ze... [more] SDM2013-102
pp.15-20
LQE, LSJ 2011-05-20
11:05
Ishikawa Kanazawa Univ. (Natural Sci. Tech. Main Bldg.) Research on a high-resolution optical spectrum control circuit and its application to a band-limited transmission system
Tatsuhiko Ikeda, Koichi Kato, Yuichiro Ikuma (Keio Univ.), Hiroshi Takahashi, Takayuki Mizuno (NTT Corp.), Hiroyuki Tsuda (Keio Univ.) LQE2011-4
Optical signal processing based on time-to-space conversion is key technology in high speed optical communication system... [more] LQE2011-4
pp.13-16
ISEC, SITE, IPSJ-CSEC 2006-07-20
10:20
Okayama Okayama Univ. A Study on Dynamic Risk Analysis Corresponding to Environmental Changes
Hideaki Kawanishi, Koichi Kato, Tatsuaki Takahashi, Ramirez Caceres Guillermo Horacio, Yoshimi Teshigawara (Soka Univ.)
(To be available after the conference date) [more] ISEC2006-17 SITE2006-14
pp.59-66
SDM 2006-06-22
10:55
Hiroshima Faculty Club, Hiroshima Univ. Realization of SiON films with small ΔVfb
Daisuke Matsushita, Koichi Muraoka, Yasushi Nakasaki, Koichi Kato, Shoko Kikuchi, Kiwamu Sakuma, Yuichiro Mitani (toshiba R&D center), Mariko Takayanagi, Kazuhiro Eguchi (Semiconductor Company)
 [more] SDM2006-56
pp.81-86
 Results 1 - 4 of 4  /   
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