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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
HIP |
2016-09-27 14:50 |
Nara |
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Gaze behavior toward sequentially presented face images in autism spectrum disorders II Takao Fukui, Makoto Wada (Res Inst of NRCD) HIP2016-45 |
[more] |
HIP2016-45 pp.15-18 |
HIP |
2015-09-29 09:55 |
Kyoto |
Kyoto Terrsa |
Gaze behavior toward sequentially presented face images in autism spectrum disorders Takao Fukui, Makoto Wada (NRCD) HIP2015-79 |
Autism spectrum disorders have deficits in social communication and previous studies demonstrated that their gaze behavi... [more] |
HIP2015-79 pp.35-38 |
CPM |
2015-08-11 11:40 |
Aomori |
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Effect of surface adsorbate on chemical shifts of core-level spectra for silicon oxinitride film Takahiro Takami, Makoto Wada, Yoshiharu Enta (Hirosaki Univ.) CPM2015-45 |
For silicon oxynitride (SiON) layers formed under specific conditions, unusual core-level spectra, which have large chem... [more] |
CPM2015-45 pp.71-74 |
SDM |
2015-03-02 13:35 |
Tokyo |
Kikai-Shinko-Kaikan Bldg |
[Invited Talk]
CNT Via Integration with Highly Dense and Selective CNT Growth Atsunobu Isobayashi, Makoto Wada, Ban Ito, Tatsuro Saito, Daisuke Nishide, T. Ishikura, Masayuki Katagiri, Yuichi Yamazaki, Takashi Matsumoto, Masayuki Kitamura, Masahito Watanabe, Naoshi Sakuma, Akihiro Kajita, Tadashi Sakai (LEAP) SDM2014-167 |
In this study, a highly selective carbon nanotube (CNT) via process was developed using a sacrificial spin-on carbon (SO... [more] |
SDM2014-167 pp.29-32 |
SDM |
2013-02-04 11:25 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
* Takashi Kurusu, Hiroyoshi Tanimoto, Makoto Wada, Atsunobu Isobayashi, Akihiro Kajita, Nobutoshi Aoki, Yoshiaki Toyoshima (Toshiba) |
[more] |
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ICD |
2012-12-17 15:55 |
Tokyo |
Tokyo Tech Front |
[Poster Presentation]
A Hardware-Friendly Object Recognition Algorithm Using Log Polar Coordinate Transformation Makoto Wada, Tadashi Shibata (UT) ICD2012-96 |
SIFT and SIFT-based algorithms are widely used in a variety of image recognition problems. However
they present the fol... [more] |
ICD2012-96 p.35 |
ICD, SDM |
2012-08-03 09:25 |
Hokkaido |
Sapporo Center for Gender Equality, Sapporo, Hokkaido |
[Invited Talk]
Nanocarbon Interconnects
-- Aiming to replace ultra-fine metal interconnects -- Akihiro Kajita, Makoto Wada, Tatsuro Saito, Masayuki Kitamura, Yuichi Yamazaki, Masayuki Katagiri, Ban Ito, Daisuke Nishide, Takashi Matsumoto, Atsunobu Isobayashi, Mariko Suzuki, Atsuko Sakata, Masahito Watanabe, Naoshi Sakuma, Tadashi Sakai (LEAP) SDM2012-78 ICD2012-46 |
The width of interconnects has been shrinking toward 10nm in accordance with LSI devices shrinkage. The resistivity of s... [more] |
SDM2012-78 ICD2012-46 pp.83-87 |
SDM |
2011-02-07 12:40 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
A highly reliable Cu interconnect with CuSiN and Ti-based barrier metal: Impact of oxgen surface treatment Yumi Hayashi, Noriaki Matsunaga, Makoto Wada, Shinichi Nakao, Kei Watanabe, Satoshi Kato, Atsuko Sakata, Akihiro Kajita, Hideki Shibata (Toshiba Corp.) SDM2010-219 |
A trade-off property of CuSiN between EM improvement and line resistance increase was resolved by a breakthrough that le... [more] |
SDM2010-219 pp.19-23 |
SDM |
2010-02-05 14:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Low resistive and highly reliable copper interconnects in combination of silicide-cap with Ti-barrier for 32 nm-node and beyond Yumi Hayashi, Noriaki Matsunaga, Makoto Wada, Shinichi Nakao, Atsuko Sakata, Kei Watanabe, Hideki Shibata (Toshiba) SDM2009-187 |
Silicide-cap for Cu interconnects is promising for enhancing electromigration (EM) performance for 32 nm-node and beyond... [more] |
SDM2009-187 pp.31-36 |
SDM |
2009-11-13 11:15 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
A Novel Monte Carlo Simulation to Evaluate the Size Effect of Resistivity for Scaled Metallic Interconnects Takashi Kurusu, Makoto Wada, Noriaki Matsunaga, Akihiro Kajita, Hiroyoshi Tanimoto, Nobutoshi Aoki, Yoshiaki Toyoshima, Hideki Shibata (Toshiba Corp.) SDM2009-145 |
Recently, the size effect on resistivity in very narrow and thin metallic wires is a crucial problem on development of s... [more] |
SDM2009-145 pp.55-60 |
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