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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2015-10-29 15:20 |
Miyagi |
Niche, Tohoku Univ. |
Ultra-Low Temperature Flattening Technique of Silicon Surface Using Xe/H2 Plasma Tomoyuki Suwa, Akinobu Teramoto, Tetsuya Goto, Masaki Hirayama, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.) SDM2015-73 |
In order to flatten any crystal orientation of Si surface including Si-fin-structure and to introduce the flattening pro... [more] |
SDM2015-73 pp.13-16 |
SDM |
2007-10-05 10:55 |
Miyagi |
Tohoku Univ. |
The Evaluation of New Amorphous Hydrocarbon Film aCHx, for Low-k Copper Barrier Film Hiraku Ishikawa (Tokyo Electron/Tohoku Univ.), Toshihisa Nozawa, Takaaki Matsuoka (Tokyo Electron Technology Development Institute), Akinobu Teramoto, Masaki Hirayama, Takashi Ito, Tadahiro Ohmi (Tohoku Univ.) SDM2007-183 |
In recent ULSI, Cu wiring and low-k dielectrics are used to reduce RC delay in interconnect. In order to increase operat... [more] |
SDM2007-183 pp.31-34 |
SDM |
2007-10-05 11:20 |
Miyagi |
Tohoku Univ. |
Development of a high efficiency Fluorocarbon abatement system utilizing plasma and Ca(OH)2/CaO under a decompression atmosphere Katsumasa Suzuki, Yoshio Ishihara, Kaoru Sakoda (Taiyo Nippon Sanso Corp.), Yasuyuki Shirai, Masaki Hirayama, Akinobu Teramoto, Tadahiro Ohmi (NICHe), Takayuki Watanabe (Ube Material Industries, Ltd.) SDM2007-184 |
[more] |
SDM2007-184 pp.35-38 |
SDM |
2007-03-15 15:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Development of Microwave-Excited Plasma Enhanced Metal-Organic Chemical Vapor deposition System and Formation of Ferroelectric Sr2(Ta1-x,Nbx)2O7 Film Ichirou Takahashi, Kiyoshi Funawa, Keita Azumi, Satoru Yamashita, Yasuyuki Shirai, Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ) |
[more] |
SDM2006-260 pp.33-37 |
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