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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 4 of 4  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2015-10-29
15:20
Miyagi Niche, Tohoku Univ. Ultra-Low Temperature Flattening Technique of Silicon Surface Using Xe/H2 Plasma
Tomoyuki Suwa, Akinobu Teramoto, Tetsuya Goto, Masaki Hirayama, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.) SDM2015-73
In order to flatten any crystal orientation of Si surface including Si-fin-structure and to introduce the flattening pro... [more] SDM2015-73
pp.13-16
SDM 2007-10-05
10:55
Miyagi Tohoku Univ. The Evaluation of New Amorphous Hydrocarbon Film aCHx, for Low-k Copper Barrier Film
Hiraku Ishikawa (Tokyo Electron/Tohoku Univ.), Toshihisa Nozawa, Takaaki Matsuoka (Tokyo Electron Technology Development Institute), Akinobu Teramoto, Masaki Hirayama, Takashi Ito, Tadahiro Ohmi (Tohoku Univ.) SDM2007-183
In recent ULSI, Cu wiring and low-k dielectrics are used to reduce RC delay in interconnect. In order to increase operat... [more] SDM2007-183
pp.31-34
SDM 2007-10-05
11:20
Miyagi Tohoku Univ. Development of a high efficiency Fluorocarbon abatement system utilizing plasma and Ca(OH)2/CaO under a decompression atmosphere
Katsumasa Suzuki, Yoshio Ishihara, Kaoru Sakoda (Taiyo Nippon Sanso Corp.), Yasuyuki Shirai, Masaki Hirayama, Akinobu Teramoto, Tadahiro Ohmi (NICHe), Takayuki Watanabe (Ube Material Industries, Ltd.) SDM2007-184
 [more] SDM2007-184
pp.35-38
SDM 2007-03-15
15:50
Tokyo Kikai-Shinko-Kaikan Bldg. Development of Microwave-Excited Plasma Enhanced Metal-Organic Chemical Vapor deposition System and Formation of Ferroelectric Sr2(Ta1-x,Nbx)2O7 Film
Ichirou Takahashi, Kiyoshi Funawa, Keita Azumi, Satoru Yamashita, Yasuyuki Shirai, Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ)
 [more] SDM2006-260
pp.33-37
 Results 1 - 4 of 4  /   
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