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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
RCC |
2020-01-27 13:20 |
Osaka |
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Relationships between control period and control performance of the remote multiple machine control system using power line communication Mitsuru Hasegawa, Kentaro Kobayashi, Hiraku Okada, Masaaki Katayama (Nagoya Univ) RCC2019-70 |
This study considers multiple machine control system using power line communication. This system use time division multi... [more] |
RCC2019-70 pp.1-6 |
RCC |
2019-01-25 14:20 |
Tokyo |
Central Research Institute of Electric Power Industry (Otemachi) |
Influence of multiple access schemes on performance of a PLC-based multi-machine control system Mitsuru Hasegawa, Kentaro Kobayashi, Hiraku Okada, Masaaki Katayama (Nagoya Univ.) RCC2018-109 |
This study discusses a multi-machine control system using power line communication. The signal to
noise ratio of PLC ch... [more] |
RCC2018-109 pp.13-18 |
WBS, ITS, RCC |
2018-12-06 13:00 |
Okinawa |
Miyako Island Hirara Port Terminal Bldg. |
[Poster Presentation]
Communication performance improvement by CDMA in PLC-based multiple machine control systems Mitsuru Hasegawa, Kentaro Kobayashi, Hiraku Okada, Masaaki Katayama (Nagoya Univ) WBS2018-50 ITS2018-33 RCC2018-81 |
This study discusses a multiple-device control system using power line communication. The signal to noise ratio of PLC c... [more] |
WBS2018-50 ITS2018-33 RCC2018-81 pp.125-129 |
VLD, IPSJ-SLDM |
2017-05-10 15:00 |
Fukuoka |
Kitakyushu International Conference Center |
A Method of Layout Pattern Classification Using Clustering Shuhei Ishino, Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) VLD2017-2 |
Layout of VLSI circuits is designed according to design rule, however, hotspots may remain due to feature size shrinking... [more] |
VLD2017-2 pp.7-12 |
VLD, DC, CPSY, RECONF, CPM, ICD, IE (Joint) [detail] |
2016-11-29 11:20 |
Osaka |
Ritsumeikan University, Osaka Ibaraki Campus |
SADP-Cut Aware Two-color Grid Routing Hatsuhiko Miura, Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) VLD2016-58 DC2016-52 |
Self-Aligned Double Patterning (SADP) is one of the promising manufacturing option to overcome the limit of miniaturizat... [more] |
VLD2016-58 DC2016-52 pp.85-90 |
VLD, IPSJ-SLDM |
2016-05-11 10:25 |
Fukuoka |
Kitakyushu International Conference Center |
Self-Aligned Double Patterning-Aware Two-color Grid Routing Hatsuhiko Miura, Mitsuru Hasegawa, Taku Hirukawa, Kunihiro Fujiyoshi (TUAT) VLD2016-2 |
Self-Aligned Double Patterning (SADP) is one of the promising manufacturing option to overcome the limit of miniaturizat... [more] |
VLD2016-2 pp.5-10 |
NLP, CAS |
2015-10-06 09:30 |
Hiroshima |
Aster Plaza |
Polygon Fracture Method Considering Maximum Shot Size for Variable Shaped-Beam Mask Writing Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) CAS2015-34 NLP2015-95 |
Since variable shaped-beam mask writing machines for LSI mask production can expose a rectangle shaped-beam, we need to ... [more] |
CAS2015-34 NLP2015-95 pp.69-74 |
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