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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 7 of 7  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
RCC 2020-01-27
13:20
Osaka   Relationships between control period and control performance of the remote multiple machine control system using power line communication
Mitsuru Hasegawa, Kentaro Kobayashi, Hiraku Okada, Masaaki Katayama (Nagoya Univ) RCC2019-70
This study considers multiple machine control system using power line communication. This system use time division multi... [more] RCC2019-70
pp.1-6
RCC 2019-01-25
14:20
Tokyo Central Research Institute of Electric Power Industry (Otemachi) Influence of multiple access schemes on performance of a PLC-based multi-machine control system
Mitsuru Hasegawa, Kentaro Kobayashi, Hiraku Okada, Masaaki Katayama (Nagoya Univ.) RCC2018-109
This study discusses a multi-machine control system using power line communication. The signal to
noise ratio of PLC ch... [more]
RCC2018-109
pp.13-18
WBS, ITS, RCC 2018-12-06
13:00
Okinawa Miyako Island Hirara Port Terminal Bldg. [Poster Presentation] Communication performance improvement by CDMA in PLC-based multiple machine control systems
Mitsuru Hasegawa, Kentaro Kobayashi, Hiraku Okada, Masaaki Katayama (Nagoya Univ) WBS2018-50 ITS2018-33 RCC2018-81
This study discusses a multiple-device control system using power line communication. The signal to noise ratio of PLC c... [more] WBS2018-50 ITS2018-33 RCC2018-81
pp.125-129
VLD, IPSJ-SLDM 2017-05-10
15:00
Fukuoka Kitakyushu International Conference Center A Method of Layout Pattern Classification Using Clustering
Shuhei Ishino, Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) VLD2017-2
Layout of VLSI circuits is designed according to design rule, however, hotspots may remain due to feature size shrinking... [more] VLD2017-2
pp.7-12
VLD, DC, CPSY, RECONF, CPM, ICD, IE
(Joint) [detail]
2016-11-29
11:20
Osaka Ritsumeikan University, Osaka Ibaraki Campus SADP-Cut Aware Two-color Grid Routing
Hatsuhiko Miura, Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) VLD2016-58 DC2016-52
Self-Aligned Double Patterning (SADP) is one of the promising manufacturing option to overcome the limit of miniaturizat... [more] VLD2016-58 DC2016-52
pp.85-90
VLD, IPSJ-SLDM 2016-05-11
10:25
Fukuoka Kitakyushu International Conference Center Self-Aligned Double Patterning-Aware Two-color Grid Routing
Hatsuhiko Miura, Mitsuru Hasegawa, Taku Hirukawa, Kunihiro Fujiyoshi (TUAT) VLD2016-2
Self-Aligned Double Patterning (SADP) is one of the promising manufacturing option to overcome the limit of miniaturizat... [more] VLD2016-2
pp.5-10
NLP, CAS 2015-10-06
09:30
Hiroshima Aster Plaza Polygon Fracture Method Considering Maximum Shot Size for Variable Shaped-Beam Mask Writing
Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) CAS2015-34 NLP2015-95
Since variable shaped-beam mask writing machines for LSI mask production can expose a rectangle shaped-beam, we need to ... [more] CAS2015-34 NLP2015-95
pp.69-74
 Results 1 - 7 of 7  /   
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