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All Technical Committee Conferences (Searched in: Recent 10 Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
HWS, VLD [detail] |
2020-03-05 13:50 |
Okinawa |
Okinawa Ken Seinen Kaikan (Okinawa) (Cancelled but technical report was issued) |
A Study of A H/W-S/W Co-design Method to Make Effective Utilization of System Resources Fumitoshi Karube, Shunsuke Tatsumi, Naoya Okada, Ryo Yamamoto, Yoshihiro Ogawa (MELCO), Abraham Goldsmith, Rien Quirynen (MERL) VLD2019-116 HWS2019-89 |
[more] |
VLD2019-116 HWS2019-89 pp.131-136 |
SDM, ICD, ITE-IST [detail] |
2019-08-07 14:15 |
Hokkaido |
Hokkaido Univ., Graduate School /Faculty of Information Science and (Hokkaido) |
TCAD analysis of the fringe-field effect on transfer characteristics of 2D channel FET Hidehiro Asai, Wen Hsin Chang, Naoya Okada, Koich Fukuda, Toshifumi Irisawa (AIST) SDM2019-37 ICD2019-2 |
Layered transition metal dichalcogenides (TMDCs) have attracted much attention as promising 2D channel
materials which ... [more] |
SDM2019-37 ICD2019-2 pp.7-10 |
SDM |
2019-02-07 15:30 |
Tokyo |
(Tokyo) |
[Invited Talk]
New contact material for advanced CMOS: cluster-preforming-deposited amorphous Si-rich W silicide film Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Toshihiko Kanayama (AIST) SDM2018-96 |
[more] |
SDM2018-96 pp.23-26 |
SDM |
2018-02-08 10:05 |
Tokyo |
Tokyo Univ. (Tokyo) |
[Invited Talk]
Cluster-Preforming-Deposited Amorphous WSin (n = 12) Insertion Film of Low SBH and High Diffusion Barrier for Direct Cu Contact Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Kazuhiko Endo, Toshihiko Kanayama (AIST) SDM2017-97 |
[more] |
SDM2017-97 pp.1-4 |
VLD |
2015-03-03 11:10 |
Okinawa |
Okinawa Seinen Kaikan (Okinawa) |
A design of FIR filters using High Level Synthesis
-- A automated design of FIR filters -- Ryo Yamamoto, Naoya Okada, Noriyuki Minegishi (MELCO) VLD2014-166 |
[more] |
VLD2014-166 pp.79-83 |
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