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Committee Date Time Place Paper Title / Authors Abstract Paper #
IBISML 2022-09-15
15:05
Kanagawa Keio Univ. (Yagami Campus)
(Primary: On-site, Secondary: Online)
Improving Efficiency of Regularization Path Computation in Safe Pattern Pruning via Multiple Referential Solutions
Takumi Yoshida (Nitech), Hiroyuki Hanada (RIKEN), Kazuya Nakagawa, Shinya Suzumura, Onur Boyar, Kazuki Iwata (Nitech), Shun Shimura, Yuji Tanaka (NaogyaU), Masayuki Karasuyama (Nitech), Kouichi Taji (NaogyaU), Koji Tsuda (UTokyo/RIKEN), Ichiro Takeuchi (NaogyaU/RIKEN) IBISML2022-38
Safe Screening and Safe Pattern Pruning are methods for efficiently modeling high-dimensional features by $L_1$-regulari... [more] IBISML2022-38
pp.39-46
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