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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
MW |
2021-03-05 10:55 |
Online |
Online |
Study on an efficient evaluation of temperature dependence for a dielectric thin film by a circular cavity resonator method Taiki Kimura, Yoshinori Kogami, Takashi Shimizu (Utsunomiya Univ.) MW2020-92 |
It is inefficient to evaluate temperature dependence for a dielectric thin film with thickness of 100 um or below by a c... [more] |
MW2020-92 pp.7-12 |
HIP |
2020-12-23 13:00 |
Online |
Online |
View from familiar angles promotes preference for objects Taiki Kimura (Waseda Univ.), Kyosiro Sasaki (Kansai Univ.), Koyo Nakamura, Katumi Watanabe (Waseda Univ.) HIP2020-66 |
Preference for visual objects changes depending on where the objects are viewed from. This effect is thought to be deriv... [more] |
HIP2020-66 pp.65-70 |
MW (2nd) |
2019-06-26 - 2019-06-28 |
Overseas |
RUS, Bangkok, Thailand |
Study on a sub-THz band grooved circular empty cavity for low loss dielectric material evaluations Taiki Kimura, Yoshinori Kogami, Takashi Shimizu (Utsunomiya Univ.) |
[more] |
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VLD, DC, CPSY, RECONF, CPM, ICD, IE (Joint) [detail] |
2016-11-29 10:30 |
Osaka |
Ritsumeikan University, Osaka Ibaraki Campus |
Accurate Lithography Simulation Model based on Deep Learning Yuki Watanabe, Tetsuaki Matsunawa, Taiki Kimura, Shigeki Nojima (Toshiba) VLD2016-56 DC2016-50 |
Lithography simulation is an indispensable technology for today's semiconductor manufacturing processes. To achieve accu... [more] |
VLD2016-56 DC2016-50 pp.73-78 |
NS, IN (Joint) |
2013-03-08 10:50 |
Okinawa |
Okinawa Zanpamisaki Royal Hotel |
A Proposal of Graph Construction Random Nodes Leaving for Application Level Multicast Taiki Kimura, Nobuyuki Takahashi (Future Univ. Hakodate) NS2012-262 |
A multicast tree for Application-Level-Multicast is reconstructed each time node leaves. Therefore, there is problem tha... [more] |
NS2012-262 pp.565-570 |
ICD, SDM |
2006-08-18 10:15 |
Hokkaido |
Hokkaido University |
Suppression effects of threshold voltage variation with Ni FUSI gate electrode for 45nm node and beyond LSTP and SRAM devices Yasunori Okayama, Tomohiro Saito, Aname Oishi, Kazuaki Nakajima, Kouji Matsuo, Syuichi Taniguchi, Takatoshi Ono, Kazuhiro Nakayama, Ryota Watanabe, Ayumi Eiho, Taiki Komoda, Taiki Kimura, Mssahumi Hamaguchi, Yoichi Takekawa, Tomonori Aoyama (TOSHIBA) |
[more] |
SDM2006-145 ICD2006-99 pp.115-120 |
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