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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
IA, SITE, IPSJ-IOT [detail] |
2010-03-01 15:10 |
Miyagi |
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Proposal of Dynamic Resource Allocation Method for Load of Web Server in the Cloud Taiki Morikawa, Atsuo Inomata, Minoru Ikebe, Yoshihiro Okamoto (NAIST), Satoshi Uda (JAIST), Kazutoshi Fujikawa (NAIST), Hideki Sunahara (Keio Univ./NAIST) SITE2009-51 IA2009-103 |
Cloud is a new computing paradigm in the Internet.
This offers flexible and usable computer resource management by the... [more] |
SITE2009-51 IA2009-103 pp.113-118 |
SDM |
2008-06-10 10:30 |
Tokyo |
An401・402, Inst. Indus. Sci., The Univ. of Tokyo |
Backside X-ray Photoelectron Spectroscopy of Ru/HfSiON Gate Stack
-- Origin of Change in Effective Work Function of Ru -- Taiki Mori, Akio Ohta, Hiromichi Yoshinaga, Seiichi Miyazaki (Hiroshima Univ.), Masaru Kadoshima, Yasuo Nara (Selete) SDM2008-50 |
2.5nm-thick HfSiON layers were deposited on thermally-grown SiO2 in the thickness range of 1 to 6nm or 0.7nm-thick SiON ... [more] |
SDM2008-50 pp.47-52 |
SDM |
2008-06-10 11:20 |
Tokyo |
An401・402, Inst. Indus. Sci., The Univ. of Tokyo |
XPS Study of TiAlN/HfSiON Gate Stack
-- Reduction of Effective Work Function Change Induced by Al Diffusion -- Akio Ohta, Taiki Mori, Hiromichi Yoshinaga, Seiichi Miyazaki (Hiroshima Univ.), Masaru Kadoshima, Yasuo Nara (Selete) SDM2008-52 |
~30nm-thick TiAlN and TiN gate were deposited on HfSiON/SiO2/Si(100) stack structure and followed by anneal at 1000º... [more] |
SDM2008-52 pp.59-64 |
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