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Committee Date Time Place Paper Title / Authors Abstract Paper #
HWS, VLD 2023-03-02
13:25
Okinawa
(Primary: On-site, Secondary: Online)
[Memorial Lecture] Wafer-Level Characteristic Variation Modeling Considering Systematic Discontinuous Effects
Takuma Nagao (NAIST), Tomoki Nakamura, Masuo Kajiyama, Makoto Eiki (Sony Semiconductor Manufacturing), Michiko Inoue (NAIST), Michihiro Shintani (Kyoto Institute of Technology) VLD2022-91 HWS2022-62
Statistical wafer-level variation modeling is an attractive method for reducing the measurement cost in large-scale inte... [more] VLD2022-91 HWS2022-62
p.109
VLD, HWS [detail] 2022-03-08
09:55
Online Online Wafer-Level Characteristic Variation Modeling with Considering Discontinuous Effect Caused by Manufacturing Equipment
Takuma Nagao (National Institute of Technology (KOSEN)), Michihiro Shintani (Nara Institute of Science and Technology), Ken'ichi Yamaguchi, Hiroshi Iwata (National Institute of Technology (KOSEN)), Tomoki Nakamura, Masuo Kajiyama, Makoto Eiki (SCK), Michiko Inoue (Nara Institute of Science and Technology) VLD2021-92 HWS2021-69
Statistical methods for predicting the performance of large-scale integrated circuits (LSIs) manufactured on a wafer are... [more] VLD2021-92 HWS2021-69
pp.87-92
MW 2017-06-23
12:10
Aichi A-101, Wing-A, Toyohashi University of Technology Quadruple-mode cavity resonator aimed at compactness and high Q factor
Takuma Nagao, Atsushi Funayama, Masaya Tamura (TUT) MW2017-30
A multimode resonator is one of the promising solutions to downsize the base station filter. However, minimization of th... [more] MW2017-30
pp.49-54
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