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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM, LQE, ED 2013-11-29
15:25
Osaka   Effects of Fabrication Process on Electrical Properties of InAlN MOS structures with ALD-Al2O3
Masahito Chiba, Takuma Nakano, Masamichi Akazawa (Hokkaido Univ.) ED2013-86 CPM2013-145 LQE2013-121
We investigated the dependence of the electrical properties on the fabrication procedure for InAlN MOS structure having ... [more] ED2013-86 CPM2013-145 LQE2013-121
pp.101-105
SDM, ED
(Workshop)
2012-06-28
10:40
Okinawa Okinawa Seinen-kaikan [Poster Presentation] Effect of hydrofluoric acid treatment on InAlN surfaces
Takuma Nakano, Masamichi Akazawa (Hokkaido Univ.)
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