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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC
(Joint) [detail]
2017-11-07
13:00
Kumamoto Kumamoto-Kenminkouryukan Parea [Invited Talk] Innovative Applications of Machine Learning in Lithography and DFM
Tetsuaki Matsunawa (Toshiba Memory) VLD2017-50 DC2017-56
 [more] VLD2017-50 DC2017-56
p.131
VLD, DC, CPSY, RECONF, CPM, ICD, IE
(Joint) [detail]
2016-11-29
10:30
Osaka Ritsumeikan University, Osaka Ibaraki Campus Accurate Lithography Simulation Model based on Deep Learning
Yuki Watanabe, Tetsuaki Matsunawa, Taiki Kimura, Shigeki Nojima (Toshiba) VLD2016-56 DC2016-50
Lithography simulation is an indispensable technology for today's semiconductor manufacturing processes. To achieve accu... [more] VLD2016-56 DC2016-50
pp.73-78
VLD 2016-03-02
10:55
Okinawa Okinawa Seinen Kaikan Lithography Hotspot Detection Using Histogram of Oriented Light Propagation
Yoichi Tomioka (UoA), Tetsuaki Matsunawa (Toshiba) VLD2015-136
In recent semiconductor manufacturing process, it is essential to detect and to remove lithography hotspots, which induc... [more] VLD2015-136
pp.143-148
VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM
(Joint) [detail]
2015-12-02
14:55
Nagasaki Nagasaki Kinro Fukushi Kaikan [Invited Talk] EDA Research Activities in The University of Texas at Austin
Tetsuaki Matsunawa (Toshiba) VLD2015-50 DC2015-46
International competition in EDA research is getting more intense.
In major international conference, such as DAC or IC... [more]
VLD2015-50 DC2015-46
p.73
 Results 1 - 4 of 4  /   
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