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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, OME 2008-04-11
14:30		 Okinawa Okinawa Seinen Kaikan Oxide-channel thin film transistors with ferroelectric and high-k gate insulators
Eisuke Tokumitsu, Hiroshi Shibata, Tomohiro Oiwa, Yohei Kondo (Tokyo Tech) SDM2008-11 OME2008-11		 (To be available after the conference date) [more] SDM2008-11 OME2008-11
pp.51-56
SDM 2008-03-14
13:55		 Tokyo Kikai-Shinko-Kaikan Bldg. Fabrication and characterization of oxide-channel ferroelectric-gate nonvolatile memory devices
Hiroshi Shibata, Tomohiro Oiwa, Eisuke Tokumitsu (Tokyo Tech) SDM2007-274		  [more] SDM2007-274
pp.7-12
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