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Committee Date Time Place Paper Title / Authors Abstract Paper #
OME, IEE-DEI 2017-07-28
13:50
Toyama Univ. of Toyama Molecular Orientation Control of Semiconducting Molecules using Metal Compound Substrate by Wet-process
Akihiro Yamada, Kohei Yamamoto (Kanazawa Univ.), Md. Shahiduzzaman (InFIniti), Tomoyuki Koganezawa (JASRI), Makoto Karakawa, Takayuki Kuwabara (Kanazawa Univ./RSET/InFIniti), Koushin Takahashi (Kanazawa Univ./RSET), Tetsuya Taima (Kanazawa Univ./RSET/InFIniti) OME2017-18
A precise control of the molecular orientation of active layer is the significant role in terms of light absorption and ... [more] OME2017-18
pp.13-16
SDM 2012-10-25
16:10
Miyagi Tohoku Univ. (Niche) Evaluation of crystalline phase in SiO2 thin film using grazing incidence X-ray diffraction
Kohki Nagata, Takuya Yamaguchi, Atsushi Ogura (Meiji Univ.), Tomoyuki Koganezawa, Ichiro Hirosawa (JASRI), Tomoyuki Suwa, Akinobu Teramoto, Takeo Hattori, Tadahiro Ohmi (NICHe) SDM2012-91
Crystalline like structures in SiO2 thin films formed using oxygen molecules/radicals were investigated by X-ray reflect... [more] SDM2012-91
pp.11-14
SDM 2010-10-22
16:20
Miyagi Tohoku University Strain evaluation in Si at atomically flat SiO2/Si interface
Maki Hattori (Meiji Univ.), Daisuke Kosemura (Meiji Univ./JSPS), Munehisa Takei, Kohki Nagata, Hiroaki Akamatsu, Motohiro Tomita, Yuuki Mizukami, Yuuki Hashiguchi, Takuya Yamaguchi, Atsushi Ogura (Meiji Univ.), Tomoyuki Suwa, Akinobu Teramoto, Takeo Hattori, Tadahiro Ohmi (NICHe), Tomoyuki Koganezawa (JASRI) SDM2010-170
We performed Raman spectroscopy and in-plane XRD measurement to clarify the structure and strain in Si at and near an at... [more] SDM2010-170
pp.71-75
 Results 1 - 3 of 3  /   
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