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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
MI |
2019-01-23 10:15 |
Okinawa |
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MI2018-89 |
[more] |
MI2018-89 pp.121-126 |
PRMU, MVE, IPSJ-CVIM [detail] |
2018-01-18 09:55 |
Osaka |
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Seina Kamada (Kyushu Univ.), Taisuke Sato, Toshiharu Suzuki (Hokkaido Univ.), Seiichi Uchida (Kyushu Univ.) PRMU2017-113 MVE2017-34 |
(To be available after the conference date) [more] |
PRMU2017-113 MVE2017-34 pp.9-14 |
PRMU, MVE, IPSJ-CVIM [detail] |
2018-01-18 17:15 |
Osaka |
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Teruaki Fujiyoshi (Kyushu Univ.), Rika Motodate, Toshiharu Suzuki (Hokkaido Univ.), Seiichi Uchida (Kyushu Univ.) PRMU2017-127 MVE2017-48 |
(To be available after the conference date) [more] |
PRMU2017-127 MVE2017-48 pp.129-134 |
PRMU, MI, IE, SIP |
2015-05-15 10:30 |
Mie |
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* Masayuki Noguchi (Kyushu Univ.), Rika Motodate, Toshiharu Suzuki (Hokkaido Univ.), Seiichi Uchida (Kyushu Univ.) SIP2015-16 IE2015-16 PRMU2015-16 MI2015-16 |
(To be available after the conference date) [more] |
SIP2015-16 IE2015-16 PRMU2015-16 MI2015-16 pp.83-88 |
PRMU |
2013-10-04 16:10 |
Chiba |
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Particle Tracking Using Network Flow Kensho Fujisaki, Yaokai Feng, Seiichi Uchida (Kyushu Univ.), Masahiko Araseki, Yuki Saito, Toshiharu Suzuki (Hokkaido Univ.) PRMU2013-64 |
[more] |
PRMU2013-64 pp.41-46 |
SDM, OME |
2012-04-27 16:10 |
Okinawa |
Okinawa-Ken-Seinen-Kaikan Bldg. |
Control of Crystallization Behavior of Silicon Thin Films by Semiconductor Blue-Multi-Diode-Laser Annealing Katsuya Shirai, Jean de Dieu Mugiraneza, Toshiharu Suzuki, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-7 OME2012-7 |
[more] |
SDM2012-7 OME2012-7 pp.33-36 |
SDM, OME |
2012-04-27 16:30 |
Okinawa |
Okinawa-Ken-Seinen-Kaikan Bldg. |
Crystallization of Si Thin Film on Poly-Imide Substrate by Semiconductor Blue Multi-Laser Diode Annealing Tatsuya Okada, Jean de Dieu Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Takashi Noguchi (Univ. Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-8 OME2012-8 |
Crystallization of a-Si films on polyimide substrate was achieved using Blue Multi-Laser Diode Annealing. Surface roughn... [more] |
SDM2012-8 OME2012-8 pp.37-39 |
SDM, OME |
2012-04-28 11:50 |
Okinawa |
Okinawa-Ken-Seinen-Kaikan Bldg. |
Crystallization of the Sputtered P-doped Si Films for High Performance Poly-Si TFT Takuma Nishinohara, J. D. Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Tadashi Ohachi (Doshisha Univ.), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-18 OME2012-18 |
After performing BLDA for phosphorus-doped Si films deposited by sputtering using Ne gas, the crystallinity of the films... [more] |
SDM2012-18 OME2012-18 pp.79-82 |
PRMU, SP |
2012-02-09 14:45 |
Miyagi |
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A denoising technique Kenta Aoki, Kensho Fujisaki, Yaokai Feng, Seiichi Uchida (Kyushu Univ.), Masahiko Araseki, Yuki Saito, Toshiharu Suzuki (Hokkaido Univ.) PRMU2011-201 SP2011-116 |
(To be available after the conference date) [more] |
PRMU2011-201 SP2011-116 pp.91-96 |
PRMU, SP |
2012-02-10 15:50 |
Miyagi |
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Particle Tracking Kensho Fujisaki, Kenta Aoki, Yaokai Feng, Seiichi Uchida (Kyushu Univ.), Masahiko Araseki, Yuki Saito, Toshiharu Suzuki (Hokkaido Univ.) PRMU2011-232 SP2011-147 |
(To be available after the conference date) [more] |
PRMU2011-232 SP2011-147 pp.207-212 |
PRMU, FM |
2010-12-09 10:00 |
Yamaguchi |
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Detection of Granular Objects in Cell by Learning Kenta Aoki, Yaokai Feng, Seiichi Uchida (Kyushu Univ.), Masahiko Araseki, Yuki Saito, Toshiharu Suzuki (Hokkaido Univ.) PRMU2010-127 |
By the development of the microscope, it is now possible to observe the moving APP-GFPs in cells. By observing their mo... [more] |
PRMU2010-127 pp.7-12 |
ED, SDM |
2010-07-02 10:00 |
Tokyo |
Tokyo Inst. of Tech. Ookayama Campus |
Acivation behaviour for doped Si films after laser or furnace annealing Takashi Noguchi, Toshiharu Suzuki (Univ. of Ryukyus) ED2010-85 SDM2010-86 |
After excimer laser annealing (ELA) for heavily boron- or phosphorous-doped Si films, the relation between the conductiv... [more] |
ED2010-85 SDM2010-86 pp.149-153 |
OME, SDM |
2009-04-24 16:40 |
Saga |
AIST Kyushu-center |
Crystallization and annealing of heavily doped p-type Si film and electronic properties Takashi Noguchi, Tomoyuki Miyahira (Univ. of the Ryukyus), Toshiharu Suzuki (SEN) SDM2009-6 OME2009-6 |
[more] |
SDM2009-6 OME2009-6 pp.25-28 |
SDM, ED |
2008-07-09 13:45 |
Hokkaido |
Kaderu2・7 |
[Invited Talk]
Precise Ion Implantation for Advanced MOS LSIs Toshiharu Suzuki (SEN) ED2008-44 SDM2008-63 |
Issues in the ion implantation technology employed in advanced MOSLSIs are addressed, where the placement of implanted i... [more] |
ED2008-44 SDM2008-63 pp.25-30 |
SDM, OME |
2008-04-11 10:35 |
Okinawa |
Okinawa Seinen Kaikan |
Electrical activation of heavily doped Si film by crystallization annealing Takashi Noguchi, Tomoyuki Miyahira, Kenji Kawai (Univ. Ryukyus), Toshiharu Suzuki, Masateru Sato (SEN) SDM2008-4 OME2008-4 |
After UV pulsed excimer laser annealing for highly
boron-, or phosphorus dosed Si film, the relationship
between the c... [more] |
SDM2008-4 OME2008-4 pp.17-22 |
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