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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2019-02-07 15:30 |
Tokyo |
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[Invited Talk]
New contact material for advanced CMOS: cluster-preforming-deposited amorphous Si-rich W silicide film Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Toshihiko Kanayama (AIST) SDM2018-96 |
[more] |
SDM2018-96 pp.23-26 |
SDM |
2018-02-08 10:05 |
Tokyo |
Tokyo Univ. |
[Invited Talk]
Cluster-Preforming-Deposited Amorphous WSin (n = 12) Insertion Film of Low SBH and High Diffusion Barrier for Direct Cu Contact Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Kazuhiko Endo, Toshihiko Kanayama (AIST) SDM2017-97 |
[more] |
SDM2017-97 pp.1-4 |
SDM |
2011-11-10 14:40 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Device Simulation of STM Carrier Profiling Koichi Fukuda, Masayasu Nishizawa, Tetsuya Tada (AIST), Leonid Bolotov (Tsukuba Univ.), Kaina Suzuki, Shigeo Sato (Fujitsu Semiconductor), Hiroshi Arimoto, Toshihiko Kanayama (AIST) SDM2011-119 |
[more] |
SDM2011-119 pp.21-26 |
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