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Committee Date Time Place Paper Title / Authors Abstract Paper #
LQE, OPE 2013-06-21
10:35
Tokyo   Silicon photonics devices on 300 mm wafer fabricated by using ArF immersion lithography
Tomohiro Kita, Yuichiro Tanushi, Masaki Nara, Syu Hirano (Tohoku Univ.), Munehiro Toyama, Miyoshi Seki, Keiji Koshino, Nobuyuki Yokoyama, Minoru Ohtsuka, Akinobu Sugiyama, Eiichi Ishitsuka, Tsukuru Sano, Tsuyoshi Horikawa (AIST), Hirohito Yamada (Tohoku Univ.) OPE2013-7 LQE2013-17
We have investigated optical characteristics of Si photonics devices formed on 300 mm SOI wafers by using ArF immersion ... [more] OPE2013-7 LQE2013-17
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