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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
HIP |
2016-09-27 16:40 |
Nara |
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[Invited Talk]
Reading brain-state by small fluctuation of eyes Yasushi Kobayashi (Osaka Univ.) HIP2016-49 |
[more] |
HIP2016-49 p.35 |
SDM |
2016-01-22 13:00 |
Tokyo |
Sanjo Conference Hall, The University of Tokyo |
[Invited Talk]
characterization of nitride thin film deposited at low temperatures Mayumi B. Takeyama, Masaru Sato (Kitami inst.), Yasushi Kobayashi, Yoshihiro Nakata, Tomoji Nakamura (Fujitsu Lab.), Atsushi Noya (Kitami inst.) SDM2015-112 |
[more] |
SDM2015-112 pp.17-20 |
CPM |
2015-11-06 14:55 |
Niigata |
Machinaka Campus Nagaoka |
Characterization of SiNx films deposited at room temperature Masaru Sato, Mayumi B. Takeyama (Kitami Inst. of Technol.), Yasushi Kobayashi, Yoshihiro Nakata, Tomoji Nakamura (Fujitsu Lab.), Atsushi Noya (Kitami Inst. of Technol.) CPM2015-88 |
[more] |
CPM2015-88 pp.23-26 |
CPM |
2015-08-10 14:40 |
Aomori |
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Low temperature deposition of SiNx films as an insulating barrier Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Technol.), Yasushi Kobayashi, Yoshihiro Nakata, Tomoji Nakamura (Fujitsu Lab.), Atsushi Noya (Kitami Inst. of Technol.) CPM2015-34 |
[more] |
CPM2015-34 pp.15-18 |
CPM |
2014-10-25 09:40 |
Nagano |
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Characterization of low-temperature deposited SiNx films applicable to 3D/2.5D-IC Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Tech.), Yasushi Kobayashi, Yoshihiro Nakata, Tomoji Nakamura (FUJITSU LAB.LTD.), Atsushi Noya (Kitami Inst. of Tech.) CPM2014-115 |
3-dimensional stacked LSI and/or 2.5-D IC is attracted much attention to solve the issues how to develop the integration... [more] |
CPM2014-115 pp.53-56 |
CPM |
2013-10-24 16:55 |
Niigata |
Niigata Univ. Satellite Campus TOKIMEITO |
Properties of SiNx films prepared by low process temperature Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Tech.), Yoshihiro Nakata, Yasushi Kobayashi, Tomoji Nakamura (FUJITSU LAB.), Atsushi Noya (Kitami Inst. of Tech.) CPM2013-100 |
3-dimensional stacked LSI is attracted much attention to solve the issues how to develop the integration density and/or ... [more] |
CPM2013-100 pp.35-39 |
SDM |
2013-02-04 15:25 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
High Reliability Technology of Fine Pitch Re-wiring for High Density Chip Package
-- Cu Re-wiring Covering with Metal-Cap Barrier Technology -- Tsuyoshi Kanki, Junya Ikeda, Shoichi Suda, Yasushi Kobayashi, Yoshihiro Nakata, Tomoji Nakamura (Fujitsu Labs) SDM2012-155 |
In advancing minimization of Cu re-wiring for highly dense chip package at lower cost, the vital technology is to suppre... [more] |
SDM2012-155 pp.25-30 |
CPM |
2012-08-09 09:50 |
Yamagata |
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Low temperature deposition of SiNx thin films by radical-assisted reaction Mayumi B. Takeyama, Masaru Sato (Kitami Inst. Technol.), Yoshihiro Nakata, Yasushi Kobayashi, Tomoji Nakamura (Fujitsu Lab. Ltd.), Atsushi Noya (Kitami Inst. Technol.) CPM2012-45 |
3-dimensional stacked LSI is of high interest to overcome the issues how to develop the integration density and/or funct... [more] |
CPM2012-45 pp.51-54 |
NC |
2005-10-17 - 2005-10-18 |
Kyoto |
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Effect of climbing fibre input on cerebellar purkinje cell activity Yuichi Kobayashi (NAIST), Mitsuo Kawato (ATR-CNS), Kenji Kawano (Kyouto-U), Yasushi Kobayashi (Osaka-U) |
[more] |
NC2005-39 pp.13-17 |
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