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Committee Date Time Place Paper Title / Authors Abstract Paper #
ED 2009-06-11
14:30		 Tokyo   Development of bevel brush scrubbing process
Yoshiya Hagimoto, Hayato Iwamoto (Sony Corp.) ED2009-38		  [more] ED2009-38
pp.11-14
ICD, SDM 2006-08-18
10:50		 Hokkaido Hokkaido University [Special Invited Talk] High Performance Dual Metal Gate CMOS with High Mobility and Low Threshold Voltage Applicable to Bulk CMOS Technology
Shinpei Yamaguchi, Kaori Tai, Tomoyuki Hirano, Takshi Ando, Susumu Hiyama, Junli Wang, Yoshiya Hagimoto, Yoshihiko Nagahama, Takayoshi Kato, Kaori Nagano, Mayumi Yamanaka, Sanae Terauchi, Saori Kanda, Ryo Yamamoto, Ｙａｓｕｓｈｉ Tateshita (STDG, SONY Corp.) 		 [more] SDM2006-146 ICD2006-100
pp.121-126
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