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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
ED, MWPTHz |
2023-12-22 11:05 |
Miyagi |
RIEC, Tohoku Univ. (Primary: On-site, Secondary: Online) |
A Waveguide Antenna Array Module for Sub-THz Communications Shiro Ozaki, Naoya Okamoto (Fujitsu), Takuichi Hirano (TCU), Yasuhiro Nakasha, Yusuke Kumazaki, Toshihiro Ohki, Naoki Hara (Fujitsu) |
[more] |
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LQE, ED, CPM |
2023-11-30 14:20 |
Shizuoka |
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Steam Oxidation Technique for Defect Reduction on ALD-Al2O3 Insulated-gate structures Shiro Ozaki, Yusuke Kumazaki, Naoya Okamoto, Yasuhiro Nakasya, Toshihiro Tagi, Naoki Hara (Fujitsu) ED2023-17 CPM2023-59 LQE2023-57 |
In this study, we investigated the effect of oxidant sources on carbon-related impurities in atomic layer deposited (ALD... [more] |
ED2023-17 CPM2023-59 LQE2023-57 pp.15-20 |
MW, ED |
2021-01-29 14:25 |
Online |
Online |
Improved power-added-efficiency in GaN-HEMT on freestanding GaN substrate with reduced interface contamination Yusuke Kumazaki, Toshihiro Ohki, Junji Kotani, Shiro Ozaki (Fujitsu/Fujitsu Labs.), Yoshitaka Niida (Fujitsu Labs.), Yuichi Minoura (Fujitsu/Fujitsu Labs.), Masato Nishimori (Fujitsu), Naoya Okamoto (Fujitsu/Fujitsu Labs.), Masaru Sato, Norikazu Nakamura (Fujitsu Labs.), Keiji Watanabe (Fujitsu/Fujitsu Labs.) ED2020-34 MW2020-87 |
[more] |
ED2020-34 MW2020-87 pp.34-37 |
MW, ED |
2019-01-17 15:00 |
Tokyo |
Hitachi, Central Research Lab. |
Pit-Assisted Ohmic Contact Technology for InAlGaN/GaN HEMTs Yusuke Kumazaki, Shiro Ozaki, Yuichi Minoura, Kozo Makiyama, Toshihiro Ooki, Naoya Okamoto, Norikazu Nakamura (FUJITSU LABORATORIES LTD.) ED2018-77 MW2018-144 |
Low contact resistance was realized in InAlGaN/GaN HEMTs by the introduction of pit structures on the metal/InAlGaN inte... [more] |
ED2018-77 MW2018-144 pp.51-54 |
CPM, LQE, ED |
2016-12-12 17:00 |
Kyoto |
Kyoto University |
Low-damage Recess Etching of AlGaN/GaN Hetero-structure by Electrochemical Process Yusuke Kumazaki, Keisuke Uemura, Taketomo Sato (Hokkaido Univ.) ED2016-66 CPM2016-99 LQE2016-82 |
Electrochemical etching process is demonstrated in this paper to fabricate recessed-gate AlGaN/GaN high electron mobilit... [more] |
ED2016-66 CPM2016-99 LQE2016-82 pp.45-50 |
ED |
2015-08-04 12:20 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Electrochemical formation and UV photoresponse properties of GaN porous structures Hirofumi Kida, Yusuke Kumazaki, Zenji Yatabe, Taketomo Sato (Hokkaido Univ.) ED2015-53 |
Photoresponse and photoabsorption properties of GaN porous structures were investigated by measuring photocurrent and sp... [more] |
ED2015-53 pp.51-54 |
ED, CPM, SDM |
2015-05-29 09:05 |
Aichi |
Venture Business Laboratory, Toyohashi University of Technology |
Spectro-electrochemical characterization of GaN/electrolyte interface and its application to the nanostructure formation Yusuke Kumazaki, Akio Watanabe, Zenji Yatabe, Taketomo Sato (Hokkaido Univ.) ED2015-28 CPM2015-13 SDM2015-30 |
[more] |
ED2015-28 CPM2015-13 SDM2015-30 pp.63-66 |
CPM, LQE, ED |
2013-11-29 16:15 |
Osaka |
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Photoelectrode properties of GaN porous structures formed by photo-assisted electrochemical process Yusuke Kumazaki, Akio Watanabe, Zenji Yatabe, Taketomo Sato (Hokkaido Univ.) ED2013-88 CPM2013-147 LQE2013-123 |
Optical properties of GaN porous structures formed by the electrochemical process were investigated. We conducted the ph... [more] |
ED2013-88 CPM2013-147 LQE2013-123 pp.113-116 |
SDM, ED, CPM |
2013-05-17 11:20 |
Shizuoka |
Shizuoka Univ. (Hamamatsu) Graduate School of Sci. and Technol. |
Photoabsorption and Photoelectric Conversion Properties of InP Porous Structures Formed by the Electrochemical process Yusuke Kumazaki, Ryohei Jinbo, Zenji Yatabe, Taketomo Sato (Hokkaido Univ.) ED2013-27 CPM2013-12 SDM2013-34 |
We investigated the optical absorption properties of InP porous structures formed by the electrochemical process using p... [more] |
ED2013-27 CPM2013-12 SDM2013-34 pp.61-64 |
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