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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2014-09-05
09:30
Yamagata The 100th Anniversary Hall, Yamagata University Growth of nonpolar GaN films by low-pressure chemical vapor deposition and their properties
Yusuke Teraguchi, Yuusuke Miyake, Tomoya Nishiyama (Nagaoka Univ. Technol.), Koichiro Oishi, Hironori Katagiri (Nagaoka Nat. Coll. Technol.), Yasuhiro Tamayama, Kanji Yasui (Nagaoka Univ. Technol.) CPM2014-83
No-polar GaN films were grown on r-planesapphire substrates using low pressure chemical vapor depsition. The GaN fiilms ... [more] CPM2014-83
pp.43-47
NS, PN
(Joint)
2005-12-15
15:50
Ehime   [Encouragement Talk] A High-speed Method for Calculating Worst-case Link Delays in EDD Connection Admission Control Scheme -- In case that many connections with large allowable end-to-end delay are established --
Ryuusuke Miyake, Tokumi Yokohira (Okayama Univ.)
In order to calculate the worst-case link delays in the EDD (Earliest Due Date) connection admission control scheme, a c... [more] NS2005-141
pp.33-36
NS 2005-05-27
11:50
Nara NARA INSTITUTE of SCIENCE and TECHNOLOGY Improvement of a High-speed Method for Calculating Worst-case Link Delays in EDD Connection Admission Control Scheme
Ryuusuke Miyake, Tokumi Yokohira (Okayama Univ.)
In order to calculate the worst-case link delays in the EDD (Earliest Due
Date) connection admission control scheme, a... [more]
NS2005-37
pp.53-56
NS, ICM 2004-11-19
13:00
Kanagawa Mitsubishi Electric Corp. Kamakura-Learning-Center (Kanagawa pref) A High-speed Calculation Method of Worst-case Link Delays for the EDD Connection Admission Control Scheme -- In the Case that Network Load is Mild --
Ryuusuke Miyake, Tokumi Yokohira (Okayama Univ.)
In the EDD connection admission control scheme, a procedure called a point schedulability check is necessary for each of... [more] NS2004-157 TM2004-60
pp.17-20
 Results 1 - 4 of 4  /   
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