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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| EA | 2024-05-22 16:50 |
Online | Online | [Invited Talk]
Fundamentals of Diffusion-based Generative Models and their Application to Speech Enhancement and Separation Scheibler Robin (LY Corp.) |
(To be available after the conference date) [more] | |
| SDM | 2021-02-05 13:45 |
Online | Online | Characteristic properties of Co-Zr alloy as a single-layer barrier Yuki Yamada, Masataka Yahagi, Junichi Koike (Tohoku Univ.)  SDM2020-56 |
The purpose of this work is to replace the thick double layer of Ta liner and TaN barrier with a single layer of Co allo... [more] | SDM2020-56 pp.7-10 |
| CPM | 2020-10-29 14:00 |
Online | Online | Mechanism of Cu(111) orientation control on extremely thin barrier Mayumi B. Takeyama (Kitami Inst.& Technol.), Mitsunobu Yasuda (Toray Research Center.), Masaru Sato (Kitami Inst.& Technol.) CPM2020-14 |
In Si-LSI and/or 3D-LSI technology, it is strongly desired to obtain Cu(111) orientation with excellent electromigration... [more] | CPM2020-14 pp.11-14 |
| CPM, IEE-MAG | 2018-11-01 15:15 |
Niigata | Machinaka campus Nagaoka | Orientation control of Cu(111) on extremely thin barrier Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Tech) CPM2018-46 |
In order to improve an electromaigration resistance, we examine the Cu grain orientation control on the thin barrier wit... [more] | CPM2018-46 pp.25-28 |
| ED | 2017-08-10 09:15 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Bio-image sensor for multi-detection of ATP, ACh, and hydrogen ion
-- Enhanced discrimination by hydrogen ion diffusion-barrier layers -- You-Na Lee, Tomoko Horio, Koichi Okumura, Tatsuya Iwata, Kazuhiro Takahashi, Kazuaki Sawada (TUT) ED2017-33 |
In our previous work, we reported a bio-image sensor for multi-detection of neurotransmitters such as adenosine triphosp... [more] | ED2017-33 pp.33-36 |
| CPM | 2015-08-11 09:40 |
Aomori | Low temperature deposition of HfNx film by radical reaction Masaru Sato, Mayumi B. Takeyama, Atsushi Noya (Kitami inst. of Technol.) CPM2015-40 |
We have demonstrated the preparation of a low-temperature deposited HfNx film as a diffusion barrier applicable to the C... [more] | CPM2015-40 pp.47-50 |
|
| SDM | 2015-03-02 15:25 |
Tokyo | Kikai-Shinko-Kaikan Bldg | [Invited Talk]
Sub-nanoscale Structure and Barrier Performance of CVD-Cu(Mn)/ALD-Co(W) Interconnect System Proved Using 3D Atom Probe Kohei Shima (The Univ. of Tokyo), Yuan Tu, Bin Han, Hisashi Takamizawa (Tohoku Univ.), Hideharu Shimizu (The Univ. of Tokyo), Yasuo Shimizu (Tohoku Univ.), Takeshi Momose (The Univ. of Tokyo), Koji Inoue, Yasuyoshi Nagai (Tohoku Univ.), Yukihiro Shimogaki (The Univ. of Tokyo) SDM2014-169 |
We propose new materials system of a single layered Co(W) barrier/liner layer coupled with a Cu(Mn) alloy seed layer for... [more] | SDM2014-169 pp.39-44 |
| CPM, LQE, ED | 2013-11-28 14:20 |
Osaka | Investigation on the optimum MQW structure for InGaN/GaN solar cells Noriyuki Watanabe, Manabu Mitsuhara, Haruki Yokoyama (NTT), Jianbo Liang, Naoteru Shigekawa (Osaka City Univ.) ED2013-70 CPM2013-129 LQE2013-105 |
We have investigated InGaN/GaN MQW solar cells on the relationship between short circuit current and the MQW structure. ... [more] | ED2013-70 CPM2013-129 LQE2013-105 pp.31-34 |
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| SDM | 2013-11-14 13:50 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Atomistic Study of Sulfur Diffusion and S2 Formation in Silicon during Low-temperature Rapid Thermal Annealing Takahisa Kanemura, Koichi Kato, Hiroyoshi Tanimoto, Nobutoshi Aoki, Yoshiaki Toyoshima (Toshiba) SDM2013-102 |
Sulfur doping at NiSi/Si junction has been found to make a Schottky barrier height ultimately small, revealing almost ze... [more] | SDM2013-102 pp.15-20 |
| CPM | 2012-10-26 17:55 |
Niigata | Interfacial reaction and/or diffusion in Cu/metal/SiO2/Si system (I)
-- Diffusion behavior of Va transition metal -- Mayumi B. Takeyama, Atsushi Noya (Kitami Inst. of Technol.) CPM2012-103 |
Cu multi-level interconnects in Si-LSIs require an effective barrier metal between Cu and a field insulating layer as a ... [more] | CPM2012-103 pp.55-60 |
|
| SDM | 2012-03-05 13:30 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Single-layered barrier/liner Co(W) by ALD/CVD for next generation ULSI-Cu interconnect Hideharu Shimizu (Taiyo Nippon Sanso/Tokyo Univ.), Kohei Shima, Takeshi Momose (Tokyo Univ.), Yoshihiko Kobayashi (Taiyo Nippon Sanso), Yukihiro Shimogaki (Tokyo Univ.) SDM2011-180 |
The effective resistivity of interconnects are predicted to be increased by ULSI shrinking. Barrier/liner layer formed o... [more] | SDM2011-180 pp.25-29 |
| CQ, CS (Joint) |
2011-04-22 14:20 |
Kagoshima | Yakushima Environmental Culture Village Center | Mean delay approximation for the mean waiting time in the GI/GI/1 queueing system Kentaro Hoshi, Yu Nonaka, Yoshitaka Takahashi, Naohisa Komatsu (Waseda Univ.) CQ2011-17 |
Diffusion approximations are developed different ways, yielding different results. In this paper we redevelop the diffu... [more] |
CQ2011-17 pp.95-98 |
| CQ, MVE, IE (Joint) [detail] |
2011-03-07 13:10 |
Nagasaki | Yasuragi IOUJIMA | A further refinement of the diffusion approximations for GI/G/1 system Kentaro Hoshi, Yu Nonaka, Yoshitaka Takahashi, Naohisa Komatsu (Waseda Univ.) |
[more] | |
| SDM | 2011-02-07 15:25 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Development of Low Temperature Bump-less TSV Process in 3D Stacking Technology Hideki Kitada, Nobuhide Maeda (The Univ. of Tokyo), Koji Fujimoto (Dai Nippon Printing), Yoriko Mizushima, Yoshihiro Nakata, Tomoji Nakamura (Fujitsu Laboratories Ltd.), Takayuki Ohba (The Univ. of Tokyo) SDM2010-224 |
Diffusion behavior of Cu in Cu through-silicon-vias (TSVs) fabricated using low-temperature plasma enhanced chemical vap... [more] | SDM2010-224 pp.49-53 |
| CPM | 2010-07-30 09:30 |
Hokkaido | Michino-Eki Shari Meeting Room | Low temperature of deposition of ZrNx film using radical reaction Masaru Sato, Mayumi B. Takeyama (kitami Inst. of Tech.), Yuichiro Hayasaka, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (kitami Inst. of Tech.) CPM2010-36 |
Recently, an increase in the integration density of the Si-ULSI system is realized in the 3-D packaging technology. A t... [more] |
CPM2010-36 pp.29-34 |
| CPM | 2009-08-11 10:50 |
Aomori | Hirosaki Univ. | Properties of ZrBx Thin Film Applicable to Cu Interconnects in Si-ULSI Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Tech.), Yuichiro Hayasaka, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (Kitami Inst. of Tech.) CPM2009-43 |
We have examined characteristics of ZrB2 films and found a peculiar property that the resistivity of the film depends on... [more] | CPM2009-43 pp.51-55 |
| CPM | 2009-08-11 11:15 |
Aomori | Hirosaki Univ. | Effectiveness of New Deposition Method for Barrier Metal Applicable to Through Silicon Via
-- Properties of ZrNx Film Formed at Low Temperature -- Masaru Sato, Mayumi B. Takeyama (Kitami Inst. of Tech.), Yuichiro Hayasaka, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (Kitami Inst. of Tech.) CPM2009-44 |
A low process temperature as low as 200°C is one of the most important requirements for the metallization technology of ... [more] | CPM2009-44 pp.57-60 |
| IN | 2007-12-13 15:25 |
Hiroshima | Hiroshima City University | Tele-traffic Analysis of a Single-server Queuing System with Time-out Scheme Kentaro Hoshi, Sumito Iijima, Yoshitaka Takahashi, Naohisa Komatsu (Waseda Univ) IN2007-103 |
We consider a renewal input, general service time, single-server, infinite-capacity queuing system with generally distri... [more] | IN2007-103 pp.25-30 |
| CPM | 2007-11-16 16:10 |
Niigata | Nagaoka University of Technology | Characterization and barrier properties of ZrB2 thin films for Cu interconnects Mayumi B. Takeyama (Kitami Inst. of Technol.), Yasuo Nakadai, Shozo Kambara (ULVAC Materials, Inc.), Masanobu Hatanaka (ULVAC, Inc.), Atsushi Noya (Kitami Inst. of Technol.) CPM2007-111 |
The extremely thin diffusion barrier deposited at low temperature is urgently required for reliable Cu interconnects ap... [more] |
CPM2007-111 pp.35-38 |
| CPM | 2007-11-16 16:35 |
Niigata | Nagaoka University of Technology | Suppression of interfacial reaction and/or diffusion in Cu/ZrN/field insulating film/Si system Mayumi B. Takeyama, Masaru Sato, Atsushi Noya (Kitami Inst. of Technol.) CPM2007-112 |
We have examined the nano-crystalline thin ZrN film with a nitrogen-rich composition as an extremely thin diffusion barr... [more] | CPM2007-112 pp.39-42 |
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