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| Presentation | 2007-10-04 15:15 Nitrogen Profile Study for SiON Gate Dielectrics of Advanced DRAM Shigemi Murakawa (Tokyo Electron/Tohoku Univ.), Masashi Takeuchi, Minoru Honda, Shu-ichi Ishizuka, Toshio Nakanishi, Yoshihiro Hirota, Takuya Sugawara, Yoshitsugu Tanaka, Yasushi Akasaka (Tokyo Electron AT), Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.) |
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| PDF Download Link |  SDM2007-175 Link to ES Tech. Rep. Archives: SDM2007-175 |
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