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| Presentation | 2017-12-01 09:20 High efficiency processing and its processing mechanism of large area diamond substrate due to plasma fusion CMP Hidetoshi Takeda (Namiki Precision Jewel Co., Ltd.), Toshiro Doi (Kyushu Univ.), Seong Woo Kim (Namiki Precision Jewel Co., Ltd.), Hideo Aida (Nagaoka Univ. Tech.), Masaharu Shiratani (Kyushu Univ.) |
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| PDF Download Link |  OME2017-35 Link to ES Tech. Rep. Archives: OME2017-35 |
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