IEICE Technical Report

Online edition: ISSN 2432-6380

Silicon Device and Materials

Workshop Date : 2024-04-20 / Issue Date : 2024-04-13

SDM2024-1
Engineering of enzymes for production of fine chemicals
Yoshiaki Yasutake, Yasuhiro Mie (AIST)
pp. 1 - 3

SDM2024-2
Thin-film enzyme electrodes and their applications
Yasuhiro Mie, Chitose Mikami, Yoshiaki Yasutake (AIST)
pp. 4 - 7

SDM2024-3
Construction of a surface plasmon resonance measurement system for probing electric field distributions in pentacene thin films
Shuya Inoue, Dai Taguchi, Takaaki Manaka (Tokyo Tech)
pp. 8 - 13

SDM2024-4
Nanoscale properties of Mo154-ring and application to edge computation
Takuya Matsumoto (Osaka Univ.)
pp. 14 - 15

SDM2024-5
Hot-band quenching in dye-filled μ-cavity from the device physics viewpoint
Sota Sumiya (UTokyo), Natsuki Tanaka, Masatoshi Ishida (TMU), Jinno Riena (UTokyo), Sugiura Ken-Ichi (TMU), Furuta Hiroyuki (Rits U), Fukatsu Susumu (UTokyo)
pp. 16 - 19

SDM2024-6
[Invited Talk] Ultra-fast Etching of Organic Thin-Films by Atmospheric Pressure Reactive Thermal Plasma Jet
Seiichiro Higashi, Kyohei Matsumoto, Jiawen Yu, Hiroaki Hanafusa (Hiroshima Univ.)
pp. 20 - 23

SDM2024-7
[Invited Talk] ReRAM/OFET integration process utilizing LaBxNy/N-doped LaB6 stacked structure
Shun-ichiro Ohmi, Jiaang Zhao (Tokyo Tech)
pp. 24 - 27

Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.

The Institute of Electronics, Information and Communication Engineers (IEICE), Japan