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| Presentation | 2007-09-21 11:25 The growth mechanism of low-resistivity ITO films onto the glass substrates by a hot-cathode plasma sputtering method Akihiko Kono, Fumiya Shoji (Kyushu Kyoritsu Univ.)  ED2007-148 OME2007-35 Link to ES Tech. Rep. Archives: ED2007-148 OME2007-35 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Tin-doped indium oxide (ITO) films fabricated on glass substrates using a hot-cathode plasma sputtering method exhibited low resistivity of 9.7×10-5 Ω cm, which is due to a high carrier density of 2.1×1021 cm-3. The change in the number of carriers, N, as a function of film thickness d, strongly suggests that oxygen extraction in the initial stages of ITO film growth on the glass substrate surface, creates oxygen vacancies as an electron carrier source for improvement in the resistivity of the films. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Low-resistivity ITO films / Oxygen vacancies / Hot-cathode plasma sputtering method / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 107, no. 227, ED2007-148, pp. 25-30, Sept. 2007. | |
| Paper # | ED2007-148 | |
| Date of Issue | 2007-09-14 (ED, OME) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2007-148 OME2007-35 Link to ES Tech. Rep. Archives: ED2007-148 OME2007-35 |
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| Conference Information | |
| Committee | ED OME |
| Conference Date | 2007-09-21 - 2007-09-21 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kyushu Institute of Technology |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | ED |
| Conference Code | 2007-09-ED-OME |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | The growth mechanism of low-resistivity ITO films onto the glass substrates by a hot-cathode plasma sputtering method |
| Sub Title (in English) | |
| Keyword(1) | Low-resistivity ITO films |
| Keyword(2) | Oxygen vacancies |
| Keyword(3) | Hot-cathode plasma sputtering method |
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| 1st Author's Name | Akihiko Kono |
| 1st Author's Affiliation | Kyushu Kyoritsu University (Kyushu Kyoritsu Univ.) |
| 2nd Author's Name | Fumiya Shoji |
| 2nd Author's Affiliation | Kyushu Kyoritsu University (Kyushu Kyoritsu Univ.) |
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| Speaker | Author-1 |
| Date Time | 2007-09-21 11:25:00 |
| Presentation Time | 25 minutes |
| Registration for | ED |
| Paper # | ED2007-148, OME2007-35 |
| Volume (vol) | vol.107 |
| Number (no) | no.227(ED), no.228(OME) |
| Page | pp.25-30 |
| #Pages | 6 |
| Date of Issue | 2007-09-14 (ED, OME) |
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