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Paper Abstract and Keywords
Presentation 2007-10-19 10:50
Development of Si Double-sided Microelectrodes with Vertical Interconnction
Risato Kobayashi, Takafumi Fukushima, Kazuhiro Sakamoto, Tetsu Tanaka, Norihiro Katayama, Hajime Mushiake, Mitsumasa Koyanagi (Tohoku Univ.)
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Conference Information
Committee NC  
Conference Date 2007-10-18 - 2007-10-19 
Place (in Japanese) (See Japanese page) 
Place (in English) Tohoku University 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Technology and Application of Brain Interface, General 
Paper Information
Registration To NC 
Conference Code 2007-10-NC 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Development of Si Double-sided Microelectrodes with Vertical Interconnction 
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1st Author's Name Risato Kobayashi  
1st Author's Affiliation Tohoku University (Tohoku Univ.)
2nd Author's Name Takafumi Fukushima  
2nd Author's Affiliation Tohoku University (Tohoku Univ.)
3rd Author's Name Kazuhiro Sakamoto  
3rd Author's Affiliation Tohoku University (Tohoku Univ.)
4th Author's Name Tetsu Tanaka  
4th Author's Affiliation Tohoku University (Tohoku Univ.)
5th Author's Name Norihiro Katayama  
5th Author's Affiliation Tohoku University (Tohoku Univ.)
6th Author's Name Hajime Mushiake  
6th Author's Affiliation Tohoku University (Tohoku Univ.)
7th Author's Name Mitsumasa Koyanagi  
7th Author's Affiliation Tohoku University (Tohoku Univ.)
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Date Time 2007-10-19 10:50:00 
Presentation Time 25 minutes 
Registration for NC 
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Volume (vol) vol.107 
Number (no) no.263 
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