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Paper Abstract and Keywords
Presentation 2007-12-14 10:00
Acceleration of Crystal Growth by Pulsed Rapid Thermal Annealing using Ni-Ferritin
Masahiro Ochi, Yuuta Sugawara, Atsushi Miura, Yukiharu Uraoka, Takashi Fuyuki (NAIST), Ichiro Yamashita (Matsushita Electric Industrial Co.,Ltd., NAIST) SDM2007-222
Abstract (in Japanese) (See Japanese page) 
(in English) Previously, we reported the fabrication method of high quality poly-Si thin film by using Ni core of ferritin with a diameter of 7 nm. In this study, we performed crystallization by pulsed rapid thermal annealing (PRTA) method for shortening crystallization time. Polycrystalline silicon thin film with crystal grain of average size of 5.4 m was obtained by PRTA with a low density of Ni core. This method is promising for fabricating high performance TFTs.
Keyword (in Japanese) (See Japanese page) 
(in English) poly-Si / Metal Induced Lateral Crystallization / Bio-nano Process / / / / /  
Reference Info. IEICE Tech. Rep., vol. 107, no. 388, SDM2007-222, pp. 1-4, Dec. 2007.
Paper # SDM2007-222 
Date of Issue 2007-12-07 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2007-12-14 - 2007-12-14 
Place (in Japanese) (See Japanese page) 
Place (in English) Nara Institute Science and Technology 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Silicon related material, process and device 
Paper Information
Registration To SDM 
Conference Code 2007-12-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Acceleration of Crystal Growth by Pulsed Rapid Thermal Annealing using Ni-Ferritin 
Sub Title (in English)  
Keyword(1) poly-Si  
Keyword(2) Metal Induced Lateral Crystallization  
Keyword(3) Bio-nano Process  
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1st Author's Name Masahiro Ochi  
1st Author's Affiliation Nara Institute of Science and Technology (NAIST)
2nd Author's Name Yuuta Sugawara  
2nd Author's Affiliation Nara Institute of Science and Technology (NAIST)
3rd Author's Name Atsushi Miura  
3rd Author's Affiliation Nara Institute of Science and Technology (NAIST)
4th Author's Name Yukiharu Uraoka  
4th Author's Affiliation Nara Institute of Science and Technology (NAIST)
5th Author's Name Takashi Fuyuki  
5th Author's Affiliation Nara Institute of Science and Technology (NAIST)
6th Author's Name Ichiro Yamashita  
6th Author's Affiliation ATRL,Matsushita Electric Industrial Co.,Ltd., Nara Institute of Science and Technology (Matsushita Electric Industrial Co.,Ltd., NAIST)
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Speaker Author-1 
Date Time 2007-12-14 10:00:00 
Presentation Time 20 minutes 
Registration for SDM 
Paper # SDM2007-222 
Volume (vol) vol.107 
Number (no) no.388 
Page pp.1-4 
#Pages 4 
Date of Issue 2007-12-07 (SDM) 

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