Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2008-04-18 13:05
[Invited Talk] 15nm Planar Bulk SONOS-type Memory with Double Junstion Tunnel Layers
Ryuji Ohba, Yuichiro Mitani, Naoharu Sugiyama, Shinobu Fujita (Toshiba) ICD2008-11
Abstract (in Japanese) (See Japanese page) 
(in English) 15nm gate length bulk-planar SONOS-type memory device, which has Si nanocrystal layer lying between double tunnel oxides, retains 2.7 decades memory window for 10 years be-low 10V write / erase (w/e) voltages. S-factor is controlled by source/drain (S/D) junction depth and channel concentration. It is experimentally shown that S to D direct tunneling deter-mines a physical limit of S-factor control below 15 nm scale. Further device scaling and improvement by Si nanocrystal scaling are possible within the limit of S-factor control..
Keyword (in Japanese) (See Japanese page) 
(in English) Si nanocrystal / Quantum dot / Flash memory / SONOS / MONOS / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 6, ICD2008-11, pp. 57-62, April 2008.
Paper # ICD2008-11 
Date of Issue 2008-04-10 (ICD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ICD2008-11

Conference Information
Committee ICD  
Conference Date 2008-04-17 - 2008-04-18 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To ICD 
Conference Code 2008-04-ICD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) 15nm Planar Bulk SONOS-type Memory with Double Junstion Tunnel Layers 
Sub Title (in English)  
Keyword(1) Si nanocrystal  
Keyword(2) Quantum dot  
Keyword(3) Flash memory  
Keyword(4) SONOS  
Keyword(5) MONOS  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Ryuji Ohba  
1st Author's Affiliation Toshiba Co. (Toshiba)
2nd Author's Name Yuichiro Mitani  
2nd Author's Affiliation Toshiba Co. (Toshiba)
3rd Author's Name Naoharu Sugiyama  
3rd Author's Affiliation Toshiba Co. (Toshiba)
4th Author's Name Shinobu Fujita  
4th Author's Affiliation Toshiba Co. (Toshiba)
5th Author's Name  
5th Author's Affiliation ()
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-1 
Date Time 2008-04-18 13:05:00 
Presentation Time 50 minutes 
Registration for ICD 
Paper # ICD2008-11 
Volume (vol) vol.108 
Number (no) no.6 
Page pp.57-62 
#Pages 6 
Date of Issue 2008-04-10 (ICD) 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan