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Paper Abstract and Keywords
Presentation 2008-04-25 15:25
Calibration Area in GTEM Cell with Optical Electric Field Sensor
Ifong Wu, Shinobu Ishigami, Kaoru Gotoh, Yasushi Matsumoto (NICT) EMCJ2008-6
Abstract (in Japanese) (See Japanese page) 
(in English) We proposed a tolerance rule for primary field components to be used for calibrating electric field probes in the gigahertz transverse electromagnetic (GTEM) cell. This rule is based on the IEC 61000-4-20 standard. Following this rule, we examined the calibration area for electric field probes. In our study, an optical electric field sensor was used to measure the electric field. The optical electric field sensor, however, was not made for measuring high electric fields. To estimate a high electric field, we estimated the linearity of the measuring system with the optical electric field sensor. We then could determine the system’s linearity. We also evaluated the effect that probes have on an electric field. We confirmed that the electric field variation with the optical electric field sensor is less than that with the electric probe. Using these results, we examined the calibration area for electric field probes in a GTEM cell. We found that the valid calibration area for electric field probes is 10 cm in the directions of left, right, up, and down from the center point or 10 cm in the upwards direction and 20 cm in the directions of left and right from the center point. These areas have a smaller electric field deviation than other areas at all frequencies. Because of this, we propose that these two areas are valid calibration areas for calibrating electric field probes. We also found that the deviation of the proposed calibration area varies greatly at frequencies where the electric field measured at the center point in the GTEM cell greatly varies.
Keyword (in Japanese) (See Japanese page) 
(in English) GTEM cell / Optical electric field sensor / Calibration area / Electric field / / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 21, EMCJ2008-6, pp. 31-36, April 2008.
Paper # EMCJ2008-6 
Date of Issue 2008-04-18 (EMCJ) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee EMCJ  
Conference Date 2008-04-25 - 2008-04-25 
Place (in Japanese) (See Japanese page) 
Place (in English) NTT Information Sharing Lab. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To EMCJ 
Conference Code 2008-04-EMCJ 
Language English (Japanese title is available) 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Calibration Area in GTEM Cell with Optical Electric Field Sensor 
Sub Title (in English)  
Keyword(1) GTEM cell  
Keyword(2) Optical electric field sensor  
Keyword(3) Calibration area  
Keyword(4) Electric field  
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1st Author's Name Ifong Wu  
1st Author's Affiliation National Institute of Information and Communications Technology (NICT)
2nd Author's Name Shinobu Ishigami  
2nd Author's Affiliation National Institute of Information and Communications Technology (NICT)
3rd Author's Name Kaoru Gotoh  
3rd Author's Affiliation National Institute of Information and Communications Technology (NICT)
4th Author's Name Yasushi Matsumoto  
4th Author's Affiliation National Institute of Information and Communications Technology (NICT)
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Speaker Author-1 
Date Time 2008-04-25 15:25:00 
Presentation Time 25 minutes 
Registration for EMCJ 
Paper # EMCJ2008-6 
Volume (vol) vol.108 
Number (no) no.21 
Page pp.31-36 
#Pages 6 
Date of Issue 2008-04-18 (EMCJ) 

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