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Paper Abstract and Keywords
Presentation 2008-11-27 09:30
Fabrication of regularly arranged InGaN/GaN nanocolumns by Ti mask selective area growth throughout rf-plasma-assisted molecular-beam epitaxy
Hiroto Sekiguchi, Akihiko Kikuchi, Katsumi Kishino (Sophia Univ.) ED2008-152 CPM2008-101 LQE2008-96 Link to ES Tech. Rep. Archives: ED2008-152 CPM2008-101 LQE2008-96
Abstract (in Japanese) (See Japanese page) 
(in English) GaN nanocolumns have high optical properties due to dislocation-free nature. We report the fabrication of regularly arranged InGaN/GaN nanocolumns using Ti mask selective area growth technology by rf-plasma-assisted molecular-beam epitaxy (rf-MBE). The SAG of GaN nanocolumns strongly depended on the growth temperature (Tg), i.e.; at the Tg below 900 oC, no SAG occurred, but above 900 oC, SAG occurred. An excess value of Tg above 900 oC brought about an increased inhomogeneity in the nanocolumn shape. Uniform nanocolumn arrays were grown around the critical temperature of 900 oC. A low supplied nitrogen suppressed the lateral growth of nanocolumn and the nucleation of GaN nanocrystals on the nitrided Ti thin layer. For regularly arranged InGaN/GaN nanocolumn arrays with different In composition, blue to red emissions were observed at room temperature and the PL-FWHM of those was narrower than those of self-organized nanocolumns. The ratio of PL integrated intensity at 300 K to that at 4 K was obtained to be 77% for a sample with 112 nm diameter and 200 nm period.
Keyword (in Japanese) (See Japanese page) 
(in English) Nanocolumn / Nanorod / Nanowire / Nitride Semiconductor / Selective-area growth / Molecular-Beam Epitaxy / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 323, LQE2008-96, pp. 1-6, Nov. 2008.
Paper # LQE2008-96 
Date of Issue 2008-11-20 (ED, CPM, LQE) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2008-152 CPM2008-101 LQE2008-96 Link to ES Tech. Rep. Archives: ED2008-152 CPM2008-101 LQE2008-96

Conference Information
Committee LQE ED CPM  
Conference Date 2008-11-27 - 2008-11-28 
Place (in Japanese) (See Japanese page) 
Place (in English) Nagoya Institute of Technology 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Nitride Based Optical and Electronic Devices, Materials and Related Technologies 
Paper Information
Registration To LQE 
Conference Code 2008-11-LQE-ED-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of regularly arranged InGaN/GaN nanocolumns by Ti mask selective area growth throughout rf-plasma-assisted molecular-beam epitaxy 
Sub Title (in English)  
Keyword(1) Nanocolumn  
Keyword(2) Nanorod  
Keyword(3) Nanowire  
Keyword(4) Nitride Semiconductor  
Keyword(5) Selective-area growth  
Keyword(6) Molecular-Beam Epitaxy  
Keyword(7)  
Keyword(8)  
1st Author's Name Hiroto Sekiguchi  
1st Author's Affiliation Sophia University (Sophia Univ.)
2nd Author's Name Akihiko Kikuchi  
2nd Author's Affiliation Sophia University (Sophia Univ.)
3rd Author's Name Katsumi Kishino  
3rd Author's Affiliation Sophia University (Sophia Univ.)
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Speaker Author-1 
Date Time 2008-11-27 09:30:00 
Presentation Time 25 minutes 
Registration for LQE 
Paper # ED2008-152, CPM2008-101, LQE2008-96 
Volume (vol) vol.108 
Number (no) no.321(ED), no.322(CPM), no.323(LQE) 
Page pp.1-6 
#Pages
Date of Issue 2008-11-20 (ED, CPM, LQE) 


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