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Paper Abstract and Keywords
Presentation 2008-12-11 13:00
Polymeric film deposition by coevaporation of polymerizable monomer and initiator
Seiji Yokokura (Tokyo Univ. of Agriculture), Masakazu Muroyama (SONY Advanced Material Lab), Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. of Agriculture) OME2008-76
Abstract (in Japanese) (See Japanese page) 
(in English) A novel method for preparing patterned polymeric thin films was proposed by means of vapor deposition of a photosensitive layer followed by photopolymerization and development. The photosensitive layers were prepared by coevaporating photoinitiatos of either 4-(Dimethylamino)-benzophenone or IRUGACURE907 with a functional monomer of 2-(9H-carbazol-9-yl)ethylmethacrylate.. It was confirmed that the photoinitiator can be vapor deposited without decomposition. UV irradiation to the coevaporated layer through a photomask initiated radical polymerization, leaving a negative pattern of the irradiated region after immersing into THF. The photopatterning process was found to give no damage to the film morphology and thickness. This method is significant as a new technoque for patterning polymer films without using the shadow mask for vapordeposition.
Keyword (in Japanese) (See Japanese page) 
(in English) deposition polymerization / lithography / vinyl monomer / patterning / organic light emitting diode / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 348, OME2008-76, pp. 1-5, Dec. 2008.
Paper # OME2008-76 
Date of Issue 2008-12-04 (OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee OME  
Conference Date 2008-12-11 - 2008-12-11 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Organic Electronics, Materials, etc. 
Paper Information
Registration To OME 
Conference Code 2008-12-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Polymeric film deposition by coevaporation of polymerizable monomer and initiator 
Sub Title (in English)  
Keyword(1) deposition polymerization  
Keyword(2) lithography  
Keyword(3) vinyl monomer  
Keyword(4) patterning  
Keyword(5) organic light emitting diode  
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Keyword(7)  
Keyword(8)  
1st Author's Name Seiji Yokokura  
1st Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. of Agriculture)
2nd Author's Name Masakazu Muroyama  
2nd Author's Affiliation SONY Corporation, Advanced Material Laboratory (SONY Advanced Material Lab)
3rd Author's Name Kuniaki Tanaka  
3rd Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. of Agriculture)
4th Author's Name Hiroaki Usui  
4th Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. of Agriculture)
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Speaker Author-1 
Date Time 2008-12-11 13:00:00 
Presentation Time 25 minutes 
Registration for OME 
Paper # OME2008-76 
Volume (vol) vol.108 
Number (no) no.348 
Page pp.1-5 
#Pages 5 
Date of Issue 2008-12-04 (OME) 

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