| 講演抄録/キーワード |
| 講演名 |
2009-04-24 15:45
導波路管型超音波洗浄機用振動子の開発 ○鈴木一成(芝浦工大/カイジョー)・小池義和(芝浦工大)・潘 毅・岡野勝一・副島潤一郎(カイジョー) US2009-5 |
| 抄録 |
(和) |
半導体ウェーハの枚葉洗浄処理にスピン洗浄機が使用されており,1MHz 程度の流水式高周波超音波振動子は微粒子除去に有効である.流水中の超音波は伝搬距離が短いが,内径4mm 程度の石英ガラス製導波路管を適用することで伝搬距離が延長される.本稿ではCMP 後洗浄での微粒子除去率(PRE)および導波路管内の音波伝
搬について評価を行う.導波路管内の音波伝搬は壁面吸収による減衰が支配的となる.音源入力5W での壁面吸収係数は計算値と一致するが,30W では異なる.このとき音源近傍の音圧は578kPa(235.2dB)に達し,導波路管出口での受波音圧レベルは非線形吸収に伴う飽和現象を示す.高調波成分の観測や衝撃波形成距離についても検討する. |
| (英) |
At single wafer processing, spin cleaner using spouting ultrasonic cleaning transducer has been developed. In
such a process, high frequency ultrasonic around 1MHz has been applied and it is effective to remove particles. Traveling
distance spouting from transducer is short. However, traveling distance could be extended by applying waveguide tube 4mm in
inner diameter. In this report, particle removable efficiency (PRE) was evaluated at the post CMP (Chemical Mechanical Planarization) cleaning, and propagation of ultrasonic in the waveguide tube was investigated. Ultrasonic in the waveguide tube become attenuated by wall effect. Experiment by 5W in input power, attenuation coefficient by wall effect is agreed with calculation, however, experiment in 30W is different from calculation. At this time, sound pressure near the sound source become 578kPa, and received sound pressure at outlet of waveguide tube become saturated by nonlinear effect. Measurement of harmonics and shock formation distance in waveguide tube was investigated. |
| キーワード |
(和) |
超音波洗浄 / CMP 後洗浄 / 導波路モード / 非線形性 / 音圧測定 / / / |
| (英) |
Ultrasonic Cleaning / Post CMP Cleaning / Waveguide mode / Nonlinearity / Sound Pressure Measurement / / / |
| 文献情報 |
信学技報, vol. 109, no. 17, US2009-5, pp. 23-28, 2009年4月. |
| 資料番号 |
US2009-5 |
| 発行日 |
2009-04-17 (US) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
著作権に ついて |
技術研究報告に掲載された論文の著作権は電子情報通信学会に帰属します.(許諾番号:10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| PDFダウンロード |
US2009-5 |