講演抄録/キーワード |
講演名 |
2009-06-24 16:15
Electrical characteristics of OFETs with thin gate dielectric ○Young-uk Song・Shun-ichiro Ohmi・Hiroshi Ishiwara(Tokyo Inst. of Tech.) ED2009-63 SDM2009-58 エレソ技報アーカイブへのリンク:ED2009-63 SDM2009-58 |
抄録 |
(和) |
In order to realize low voltage operation of pentacene-based field-effect-transistors (FETs), we have fabricated pantacene-based metal-oxide-semiconductor (MOS) diodes and FETs with thin SiO2 gate dielectric, such as 3-10 nm. Excellent capacitance-voltage (C-V) characteristics of pentacene-based MOS diodes were observed with small hysteresis width even though the gate dielectric thickness was very thin, such as 3 nm. It also showed high mobility as 0.3 cm2/Vs and low operation voltage in the pentacene FETs. |
(英) |
In order to realize low voltage operation of pentacene-based field-effect-transistors (FETs), we have fabricated pantacene-based metal-oxide-semiconductor (MOS) diodes and FETs with thin SiO2 gate dielectric, such as 3-10 nm. Excellent capacitance-voltage (C-V) characteristics of pentacene-based MOS diodes were observed with small hysteresis width even though the gate dielectric thickness was very thin, such as 3 nm. It also showed high mobility as 0.3 cm2/Vs and low operation voltage in the pentacene FETs. |
キーワード |
(和) |
pentacene / OFETs / pentacene mobility / low operation voltage / / / / |
(英) |
pentacene / OFETs / pentacene mobility / low operation voltage / / / / |
文献情報 |
信学技報, vol. 109, no. 97, ED2009-63, pp. 59-62, 2009年6月. |
資料番号 |
ED2009-63 |
発行日 |
2009-06-17 (ED, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
著作権に ついて |
技術研究報告に掲載された論文の著作権は電子情報通信学会に帰属します.(許諾番号:10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
PDFダウンロード |
ED2009-63 SDM2009-58 エレソ技報アーカイブへのリンク:ED2009-63 SDM2009-58 |