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Paper Abstract and Keywords
Presentation 2009-10-30 16:15
Effect of real contact point on constriction resistance of apparent contact area
Shigeru Sawada, Terutaka Tamai (Mie Univ,), Yasuhiro Hattori (AutoNetworks Technologyies, Ltd.), Kazuo Iida (Mie Univ,) EMD2009-65
Abstract (in Japanese) (See Japanese page) 
(in English) Many researchers have studied influences of contact shape, plating conditions, and surface roughness on constriction resistance in contact-point contingence. However, any detail researches have not been made to know how constriction resistance in the apparent contact area of connector contact depends on the distribution status of real contact points and depends on the real contact area. In our study, therefore, constriction resistance is calculated by considering current-carrying-spot area and dispersion-status dependence using numerical analysis. This study proves that contact resistance does not increase beyond 1.5 times even if the real contact area is about 15% of the apparent contact area. This study also proves that when real contact area is at least about 60% of the apparent contact area, the contact resistance is approximately the same as the constriction resistance acquired from the apparent contact area. When the real contact area is about 50% of the apparent contact area, the contact resistance is approximately constant without regard to the contact shape and contact-point dispersion layout. Therefore, it is proved that contact resistance can be practically calculated using apparent contact area instead of real contact area when there are many electrical contact points caused by metal adhesion.
Keyword (in Japanese) (See Japanese page) 
(in English) Electrical contact / constriction resistance / real contact area / numerical analysis / apparent contact area / / /  
Reference Info. IEICE Tech. Rep., vol. 109, no. 263, EMD2009-65, pp. 39-44, Oct. 2009.
Paper # EMD2009-65 
Date of Issue 2009-10-23 (EMD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee EMD  
Conference Date 2009-10-30 - 2009-10-30 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To EMD 
Conference Code 2009-10-EMD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Effect of real contact point on constriction resistance of apparent contact area 
Sub Title (in English)  
Keyword(1) Electrical contact  
Keyword(2) constriction resistance  
Keyword(3) real contact area  
Keyword(4) numerical analysis  
Keyword(5) apparent contact area  
Keyword(6)  
Keyword(7)  
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1st Author's Name Shigeru Sawada  
1st Author's Affiliation Mie University (Mie Univ,)
2nd Author's Name Terutaka Tamai  
2nd Author's Affiliation Mie University (Mie Univ,)
3rd Author's Name Yasuhiro Hattori  
3rd Author's Affiliation AutoNetworks Technologyies, Ltd. (AutoNetworks Technologyies, Ltd.)
4th Author's Name Kazuo Iida  
4th Author's Affiliation Mie University (Mie Univ,)
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Speaker Author-1 
Date Time 2009-10-30 16:15:00 
Presentation Time 25 minutes 
Registration for EMD 
Paper # EMD2009-65 
Volume (vol) vol.109 
Number (no) no.263 
Page pp.39-44 
#Pages 6 
Date of Issue 2009-10-23 (EMD) 

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