Paper Abstract and Keywords |
Presentation |
2009-11-20 09:55
High rate growth of GaN using 4 inch x 11 multi wafer MOVPE reactor (UR25K) Yoshiki Yano, Kazutada Ikenaga, Hiroki Tokunaga (Taiyo Nippon Sanso), Jun Yamamoto (TN EMC), Toshiya Tabuchi (Taiyo Nippon Sanso), Kousuke Uchiyama (TN EMC), Akira Yamaguchi, Yasushi Fukuda, Akinori Ubukata (Taiyo Nippon Sanso), Yasuhiro Harada, Yuzaburo Ban, Koh Matsumoto (TN EMC), Toshiaki Yamazaki (Taiyo Nippon Sanso) ED2009-148 CPM2009-122 LQE2009-127 Link to ES Tech. Rep. Archives: ED2009-148 CPM2009-122 LQE2009-127 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We have developed a multiwafer MOVPE reactor with a capacity of eleven 4 inch wafers(UR25K). In order to shorten the growth time of GaN-based devices, we have grown GaN at 10$\micro\m/h under atmospheric pressure using UR25K. The full width at half maximum values of the X-ray diffraction rocking curve for the (0002) and (10-12) directions were 200 arcsec and 260 arcsec, respectively. The residual carbon concentration was 2.5 × 1016 cm-3. We have grown two samples of simple blue-LED structure. The n-GaN growth rates of the samples were 3.6$\micro\m/h and 10$\micro$m/h, respectively. Electroluminescence characteristics of the two were almost the same level. These results indicate that the high rate growth of GaN using UR25K can contribute to shortening the growth time of GaN-based devices. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
MOVPE / multiwafer MOVPE / high rate growth / GaN / LED / parasitic reaction / / |
Reference Info. |
IEICE Tech. Rep., vol. 109, no. 288, ED2009-148, pp. 95-98, Nov. 2009. |
Paper # |
ED2009-148 |
Date of Issue |
2009-11-12 (ED, CPM, LQE) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2009-148 CPM2009-122 LQE2009-127 Link to ES Tech. Rep. Archives: ED2009-148 CPM2009-122 LQE2009-127 |
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