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Paper Abstract and Keywords
Presentation 2010-11-12 11:20
Development of Automated System of Ultra-Accelerated Quantum Chemical Molecular Dynamics Method and Oxidation Simulation of Silicon Surface
Hideyuki Tsuboi, Kenji Inaba, Mariko Ise, Yukie Hayashi, Yuka Suzuki, Hiromi Sato, Yukiko Obara, Ryo Nagumo, Ryuji Miura, Ai Suzuki, Nozomu Hatakeyama, Akira Endou, Hiromitsu Takaba, Momoji Kubo, Akira Miyamoto (Tohoku) SDM2010-178
Abstract (in Japanese) (See Japanese page) 
(in English) Using our newly developed automated system of ultra-accelerated quantum chemical molecular dynamics method, we have investigated the initial process for dry, wet and radical oxidation reaction of silicon surface. In this report, we have analyzed the behavior of reactant molecules during the surface chemical reaction
Keyword (in Japanese) (See Japanese page) 
(in English) Silicon surface / / / / / / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 274, SDM2010-178, pp. 41-43, Nov. 2010.
Paper # SDM2010-178 
Date of Issue 2010-11-04 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2010-178

Conference Information
Committee SDM  
Conference Date 2010-11-11 - 2010-11-12 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process, Device, Circuit Simulations, etc 
Paper Information
Registration To SDM 
Conference Code 2010-11-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Development of Automated System of Ultra-Accelerated Quantum Chemical Molecular Dynamics Method and Oxidation Simulation of Silicon Surface 
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Keyword(1) Silicon surface  
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1st Author's Name Hideyuki Tsuboi  
1st Author's Affiliation Tohoku University (Tohoku)
2nd Author's Name Kenji Inaba  
2nd Author's Affiliation Tohoku University (Tohoku)
3rd Author's Name Mariko Ise  
3rd Author's Affiliation Tohoku University (Tohoku)
4th Author's Name Yukie Hayashi  
4th Author's Affiliation Tohoku University (Tohoku)
5th Author's Name Yuka Suzuki  
5th Author's Affiliation Tohoku University (Tohoku)
6th Author's Name Hiromi Sato  
6th Author's Affiliation Tohoku University (Tohoku)
7th Author's Name Yukiko Obara  
7th Author's Affiliation Tohoku University (Tohoku)
8th Author's Name Ryo Nagumo  
8th Author's Affiliation Tohoku University (Tohoku)
9th Author's Name Ryuji Miura  
9th Author's Affiliation Tohoku University (Tohoku)
10th Author's Name Ai Suzuki  
10th Author's Affiliation Tohoku University (Tohoku)
11th Author's Name Nozomu Hatakeyama  
11th Author's Affiliation Tohoku University (Tohoku)
12th Author's Name Akira Endou  
12th Author's Affiliation Tohoku University (Tohoku)
13th Author's Name Hiromitsu Takaba  
13th Author's Affiliation Tohoku University (Tohoku)
14th Author's Name Momoji Kubo  
14th Author's Affiliation Tohoku University (Tohoku)
15th Author's Name Akira Miyamoto  
15th Author's Affiliation Tohoku University (Tohoku)
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Speaker Author-1 
Date Time 2010-11-12 11:20:00 
Presentation Time 25 minutes 
Registration for SDM 
Paper # SDM2010-178 
Volume (vol) vol.110 
Number (no) no.274 
Page pp.41-43 
#Pages 3 
Date of Issue 2010-11-04 (SDM) 

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