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| Presentation | 2011-03-11 16:35 A Study of Degradatuion Phenomenon of electrical Contacts by some Oscillating Mechanisms -- Modeling about Fluctuation of Contact Resistance -- Shin-ichi Wada, Keiji Koshida, Saindaa Norovling, Masahiro Kawanobe, Masayoshi Kotabe, Hiroaki Kubota (TMC), Tohru Ikeguchi (Saitama Univ.), Yoshihiko Horio (Tokyo Denki Univ.), Koichiro Sawa (Nippon Insti. of Tech.)  NLP2010-196 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | The authors have developed some mechanisms which give real vibration to electrical contacts and studied the influences of a micro-oscillating on the contact resistance. Because it was necessary to deal with time-sequential data for analyzing the degradation phenomena of electrical contacts by the oscillating mechanisms, they tried non-linear data processing in addition to usually linear one. It was considered that the process extracted the characteristic of time-sequential fluctuation of the contact resistance from experimental results. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | degradation phenomenon / electrical contact / oscillating mechanism / contact resistance / time-sequential data / non-linear processing / / | |
| Reference Info. | IEICE Tech. Rep., vol. 110, no. 465, NLP2010-196, pp. 187-192, March 2011. | |
| Paper # | NLP2010-196 | |
| Date of Issue | 2011-03-03 (NLP) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | NLP2010-196 |
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| Conference Information | |
| Committee | NLP |
| Conference Date | 2011-03-10 - 2011-03-11 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Tokyo University of Science |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | General |
| Paper Information | |
| Registration To | NLP |
| Conference Code | 2011-03-NLP |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A Study of Degradatuion Phenomenon of electrical Contacts by some Oscillating Mechanisms |
| Sub Title (in English) | Modeling about Fluctuation of Contact Resistance |
| Keyword(1) | degradation phenomenon |
| Keyword(2) | electrical contact |
| Keyword(3) | oscillating mechanism |
| Keyword(4) | contact resistance |
| Keyword(5) | time-sequential data |
| Keyword(6) | non-linear processing |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Shin-ichi Wada |
| 1st Author's Affiliation | TMC System Co. Ltd. (TMC) |
| 2nd Author's Name | Keiji Koshida |
| 2nd Author's Affiliation | TMC System Co. Ltd. (TMC) |
| 3rd Author's Name | Saindaa Norovling |
| 3rd Author's Affiliation | TMC System Co. Ltd. (TMC) |
| 4th Author's Name | Masahiro Kawanobe |
| 4th Author's Affiliation | TMC System Co. Ltd. (TMC) |
| 5th Author's Name | Masayoshi Kotabe |
| 5th Author's Affiliation | TMC System Co. Ltd. (TMC) |
| 6th Author's Name | Hiroaki Kubota |
| 6th Author's Affiliation | TMC System Co. Ltd. (TMC) |
| 7th Author's Name | Tohru Ikeguchi |
| 7th Author's Affiliation | Saitama University (Saitama Univ.) |
| 8th Author's Name | Yoshihiko Horio |
| 8th Author's Affiliation | Tokyo Denki University (Tokyo Denki Univ.) |
| 9th Author's Name | Koichiro Sawa |
| 9th Author's Affiliation | Nippon Institute of Technology (Nippon Insti. of Tech.) |
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| Speaker | Author-1 |
| Date Time | 2011-03-11 16:35:00 |
| Presentation Time | 25 minutes |
| Registration for | NLP |
| Paper # | NLP2010-196 |
| Volume (vol) | vol.110 |
| Number (no) | no.465 |
| Page | pp.187-192 |
| #Pages | 6 |
| Date of Issue | 2011-03-03 (NLP) |
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