| 講演抄録/キーワード |
| 講演名 |
2011-05-20 13:05
Contact Capacitance of 10-1000 Microfarads in Parallel with Contact Resistances between Closed Metal Electrodes ○Eisuke Takano(Consultant) EMD2011-1 |
| 抄録 |
(和) |
(まだ登録されていません) |
| (英) |
The contact capacitance was investigated by measuring the phase shift between the alternating contact voltage and current of 10 kHz with Cu-Cu and Ni-Ni contacts having a contact resistance of 0.003 to 0.3 Ohm. The contact current flew 7 to 14 degrees (2 to 4 microseconds) in advance of the voltage as if the contact impedance were capacitance-controlled. The resultant capacitances were estimated at 10 to 1000 microfarad in parallel with the tunnel resistances. Also measurements using a capacitance-resistance bridge proved the capacitances to be in agreement with the values mentioned above. Possible theories were proposed. |
| キーワード |
(和) |
/ / / / / / / |
| (英) |
Closed contact / Contact capacitance / Contact current / Contact voltage / tunnel resistance / / / |
| 文献情報 |
信学技報, vol. 111, no. 55, EMD2011-1, pp. 1-6, 2011年5月. |
| 資料番号 |
EMD2011-1 |
| 発行日 |
2011-05-13 (EMD) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
著作権に ついて |
技術研究報告に掲載された論文の著作権は電子情報通信学会に帰属します.(許諾番号:10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| PDFダウンロード |
EMD2011-1 |