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Paper Abstract and Keywords
Presentation 2011-12-16 14:00
Fabrication of 2D Photonic-Crystal by ZnO using Gel-Nanoimprint Process
Min Zhang, Shinji Araki, Li Lu, Masahiro Horita, Takashi Nishida, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) SDM2011-140
Abstract (in Japanese) (See Japanese page) 
(in English) In this research, 2D-photonic-crystal ZnO films were fabricated using sol-gel spin-coating and nanoimprint lithography (NIL) processes. The temperatures for drying of the precursor coated on the glass substrate were set to 80-250 ℃ to evaporate the solvent. It was succeeded that the NIL patterning process was replicated only the samples which were heated at 180 and 220 ℃. However, the 220 ℃ heating process produced clear pattern which fitted the PDMS mold design very well. The ZnO films were annealed in oxygen and air atmosphere after patterned, in order to examine the dependence of the annealing conditions. The both of them showed same wurtzite structure. However the film annealed in oxygen atmosphere exhibited higher refractive index of 1.92 (at 790 nm) which closes to that of conventional ZnO film.
Keyword (in Japanese) (See Japanese page) 
(in English) ZnO / Sol-gel / Nanoimprint lithography / Spin-coating / / / /  
Reference Info. IEICE Tech. Rep., vol. 111, no. 357, SDM2011-140, pp. 43-46, Dec. 2011.
Paper # SDM2011-140 
Date of Issue 2011-12-09 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2011-12-16 - 2011-12-16 
Place (in Japanese) (See Japanese page) 
Place (in English) NAIST 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Fabrication and Evaluation of Silicon related Materials 
Paper Information
Registration To SDM 
Conference Code 2011-12-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of 2D Photonic-Crystal by ZnO using Gel-Nanoimprint Process 
Sub Title (in English)  
Keyword(1) ZnO  
Keyword(2) Sol-gel  
Keyword(3) Nanoimprint lithography  
Keyword(4) Spin-coating  
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Keyword(6)  
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1st Author's Name Min Zhang  
1st Author's Affiliation Nara Institute of Science and Technology (NAIST)
2nd Author's Name Shinji Araki  
2nd Author's Affiliation Nara Institute of Science and Technology (NAIST)
3rd Author's Name Li Lu  
3rd Author's Affiliation Nara Institute of Science and Technology (NAIST)
4th Author's Name Masahiro Horita  
4th Author's Affiliation Nara Institute of Science and Technology (NAIST)
5th Author's Name Takashi Nishida  
5th Author's Affiliation Nara Institute of Science and Technology (NAIST)
6th Author's Name Yasuaki Ishikawa  
6th Author's Affiliation Nara Institute of Science and Technology (NAIST)
7th Author's Name Yukiharu Uraoka  
7th Author's Affiliation Nara Institute of Science and Technology (NAIST)
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Speaker Author-1 
Date Time 2011-12-16 14:00:00 
Presentation Time 20 minutes 
Registration for SDM 
Paper # SDM2011-140 
Volume (vol) vol.111 
Number (no) no.357 
Page pp.43-46 
#Pages 4 
Date of Issue 2011-12-09 (SDM) 

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