| Conference Information |
| Committee |
SDM |
| Conference Date |
2012-10-25 - 2012-10-26 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Tohoku Univ. (Niche) |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Process science and new process technologies |
| Paper Information |
| Registration To |
SDM |
| Conference Code |
2012-10-SDM |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Analysis of Plasma-Induced Si Substrate Damage using Temperature-Controlled Photoreflectance Spectroscopy and Defect Distribution Profiling using Wet Etching |
| Sub Title (in English) |
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| Keyword(1) |
plasma etching |
| Keyword(2) |
plasma-induced damage |
| Keyword(3) |
defects |
| Keyword(4) |
photoreflectance spectroscopy |
| Keyword(5) |
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| Keyword(6) |
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| Keyword(7) |
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| Keyword(8) |
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| 1st Author's Name |
Asahiko Matsuda |
| 1st Author's Affiliation |
Kyoto University (Kyoto Univ.) |
| 2nd Author's Name |
Yoshinori Nakakubo |
| 2nd Author's Affiliation |
Kyoto University (Kyoto Univ.) |
| 3rd Author's Name |
Yoshinori Takao |
| 3rd Author's Affiliation |
Kyoto University (Kyoto Univ.) |
| 4th Author's Name |
Koji Eriguchi |
| 4th Author's Affiliation |
Kyoto University (Kyoto Univ.) |
| 5th Author's Name |
Kouichi Ono |
| 5th Author's Affiliation |
Kyoto University (Kyoto Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2012-10-25 16:35:00 |
| Presentation Time |
25 minutes |
| Registration for |
SDM |
| Paper # |
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| Volume (vol) |
vol.112 |
| Number (no) |
no.263 |
| Page |
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| Date of Issue |
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