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Paper Abstract and Keywords
Presentation 2013-03-05 10:10
Study on plasma sources for semiconductor manufacturing and plasma bioscience
Taisei Motomura, Yuji Kasashima, Fumihiko Uesugi, Kazuya Kikunaga, Osamu Fukuda (AIST) OME2012-91
Abstract (in Japanese) (See Japanese page) 
(in English) To activate local industries with the aim of increasing the competitiveness of the local industry, we propose a useful measurement technique not only for semiconductor manufacturing but also for agriculture, especially livestock production. For applications to semiconductor manufacturing technology and plasma bioscience fields, various types of plasma sources have been developed in a wide range of gas pressure from 0.1 Pa to atmospheric pressure. In this presentation, we give an overview of various plasma sources, and a newly developed real-time monitoring system of characteristic impedance during plasma etching process is also presented.
Keyword (in Japanese) (See Japanese page) 
(in English) plasma / semiconductor manufacturing / / / / / /  
Reference Info. IEICE Tech. Rep., vol. 112, no. 456, OME2012-91, pp. 5-7, March 2013.
Paper # OME2012-91 
Date of Issue 2013-02-26 (OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee OME  
Conference Date 2013-03-05 - 2013-03-05 
Place (in Japanese) (See Japanese page) 
Place (in English) AIST Kyushu Center 
Topics (in Japanese) (See Japanese page) 
Topics (in English) biotechnology, electronics, materials, interfaces, in situ observation, etc. 
Paper Information
Registration To OME 
Conference Code 2013-03-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Study on plasma sources for semiconductor manufacturing and plasma bioscience 
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Keyword(1) plasma  
Keyword(2) semiconductor manufacturing  
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1st Author's Name Taisei Motomura  
1st Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
2nd Author's Name Yuji Kasashima  
2nd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
3rd Author's Name Fumihiko Uesugi  
3rd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
4th Author's Name Kazuya Kikunaga  
4th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
5th Author's Name Osamu Fukuda  
5th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
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Speaker Author-1 
Date Time 2013-03-05 10:10:00 
Presentation Time 25 minutes 
Registration for OME 
Paper # OME2012-91 
Volume (vol) vol.112 
Number (no) no.456 
Page pp.5-7 
#Pages 3 
Date of Issue 2013-02-26 (OME) 

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