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Paper Abstract and Keywords
Presentation 2014-03-04 13:20
[Invited Talk] Advanced Model-Based Hotspot Fix Flow for Layout Optimization with Genetic Algorithm
Shuhei Sota (Toshiba Microelectronics), Taiga Uno, Masanari Kajiwara, Chikaaki Kodama (Toshiba), Hirotaka Ichikawa (Toshiba Microelectronics), Ryota Aburada, Toshiya Kotani (Toshiba), Kei Nakagawa, Tamaki Saito (Toshiba Microelectronics) VLD2013-148
Abstract (in Japanese) (See Japanese page) 
(in English) Under the low-k1 lithography process, many hotspots are generated and their reduction is an urgent issue for mass production. Several strategies for hotspots fix (HSF) were proposed so far. Among them, two major strategies are "rule-based HSF” and “pattern matching-based HSF". The former is a simple strategy of expanding the width of narrow patterns and spaces based on pre-determined rule to remove hotspots. However, hotspots unable to remove by this strategy are increasing in recent 32nm and 28nm node. On the other hand, the latter is more effective than the former. This HSF can remove hotspots by replacing the pattern with the corresponding fixed pattern if both patterns are registered in the library. When they are not registered, it is understood that hotspots cannot be removed. Therefore, we propose a new model-based HSF strategy. Our strategy finds minimum width of pattern and minimum space between patterns and tries to remove hotspots by moving edges of the patterns. Genetic algorithm determines appropriately which edges to move and how long. The experimental results show the effectiveness of our strategy.
Keyword (in Japanese) (See Japanese page) 
(in English) Lithography / Hotspot / HSF / Genetic algorithm / Model-based HSF / / /  
Reference Info. IEICE Tech. Rep., vol. 113, no. 454, VLD2013-148, pp. 85-85, March 2014.
Paper # VLD2013-148 
Date of Issue 2014-02-24 (VLD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee VLD  
Conference Date 2014-03-03 - 2014-03-05 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Technology for System-on-Silicon 
Paper Information
Registration To VLD 
Conference Code 2014-03-VLD 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Advanced Model-Based Hotspot Fix Flow for Layout Optimization with Genetic Algorithm 
Sub Title (in English)  
Keyword(1) Lithography  
Keyword(2) Hotspot  
Keyword(3) HSF  
Keyword(4) Genetic algorithm  
Keyword(5) Model-based HSF  
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1st Author's Name Shuhei Sota  
1st Author's Affiliation Toshiba Microelectronics Corpration (Toshiba Microelectronics)
2nd Author's Name Taiga Uno  
2nd Author's Affiliation Toshiba Corporation (Toshiba)
3rd Author's Name Masanari Kajiwara  
3rd Author's Affiliation Toshiba Corporation (Toshiba)
4th Author's Name Chikaaki Kodama  
4th Author's Affiliation Toshiba Corporation (Toshiba)
5th Author's Name Hirotaka Ichikawa  
5th Author's Affiliation Toshiba Microelectronics Corpration (Toshiba Microelectronics)
6th Author's Name Ryota Aburada  
6th Author's Affiliation Toshiba Corporation (Toshiba)
7th Author's Name Toshiya Kotani  
7th Author's Affiliation Toshiba Corporation (Toshiba)
8th Author's Name Kei Nakagawa  
8th Author's Affiliation Toshiba Microelectronics Corpration (Toshiba Microelectronics)
9th Author's Name Tamaki Saito  
9th Author's Affiliation Toshiba Microelectronics Corpration (Toshiba Microelectronics)
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Speaker Author-1 
Date Time 2014-03-04 13:20:00 
Presentation Time 25 minutes 
Registration for VLD 
Paper # VLD2013-148 
Volume (vol) vol.113 
Number (no) no.454 
Page p.85 
#Pages
Date of Issue 2014-02-24 (VLD) 


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