Paper Abstract and Keywords |
Presentation |
2014-03-04 13:20
[Invited Talk]
Advanced Model-Based Hotspot Fix Flow for Layout Optimization with Genetic Algorithm Shuhei Sota (Toshiba Microelectronics), Taiga Uno, Masanari Kajiwara, Chikaaki Kodama (Toshiba), Hirotaka Ichikawa (Toshiba Microelectronics), Ryota Aburada, Toshiya Kotani (Toshiba), Kei Nakagawa, Tamaki Saito (Toshiba Microelectronics) VLD2013-148 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Under the low-k1 lithography process, many hotspots are generated and their reduction is an urgent issue for mass production. Several strategies for hotspots fix (HSF) were proposed so far. Among them, two major strategies are "rule-based HSF” and “pattern matching-based HSF". The former is a simple strategy of expanding the width of narrow patterns and spaces based on pre-determined rule to remove hotspots. However, hotspots unable to remove by this strategy are increasing in recent 32nm and 28nm node. On the other hand, the latter is more effective than the former. This HSF can remove hotspots by replacing the pattern with the corresponding fixed pattern if both patterns are registered in the library. When they are not registered, it is understood that hotspots cannot be removed. Therefore, we propose a new model-based HSF strategy. Our strategy finds minimum width of pattern and minimum space between patterns and tries to remove hotspots by moving edges of the patterns. Genetic algorithm determines appropriately which edges to move and how long. The experimental results show the effectiveness of our strategy. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Lithography / Hotspot / HSF / Genetic algorithm / Model-based HSF / / / |
Reference Info. |
IEICE Tech. Rep., vol. 113, no. 454, VLD2013-148, pp. 85-85, March 2014. |
Paper # |
VLD2013-148 |
Date of Issue |
2014-02-24 (VLD) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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VLD2013-148 |
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