Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information		 Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2016-11-29 11:20
SADP-Cut Aware Two-color Grid Routing
Hatsuhiko Miura, Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) VLD2016-58 DC2016-52
Abstract (in Japanese) (See Japanese page) 
(in English) Self-Aligned Double Patterning (SADP) is one of the promising manufacturing option to overcome the limit of miniaturization.
However, routing design for SADP process is very complicated.
In this paper, we propose a thoughtful routing method using two-color grid for SADP-Cut process.
It can solve high density routing problems with planning to realize cut-regions.
Experimental results show that our method achieves shorter wire length.
Keyword (in Japanese) (See Japanese page) 
(in English) Double Patterning / SADP / Cut Process / SADP-Cut / Grid Routing / / /  
Reference Info. IEICE Tech. Rep., vol. 116, no. 330, VLD2016-58, pp. 85-90, Nov. 2016.
Paper # VLD2016-58 
Date of Issue 2016-11-21 (VLD, DC) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF VLD2016-58 DC2016-52

Conference Information
Committee VLD DC CPSY RECONF CPM ICD IE  
Conference Date 2016-11-28 - 2016-11-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Ritsumeikan University, Osaka Ibaraki Campus 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Gaia 2016 -New Field of VLSI Design- 
Paper Information
Registration To VLD 
Conference Code 2016-11-VLD-DC-CPSY-RECONF-CPM-ICD-IE 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) SADP-Cut Aware Two-color Grid Routing 
Sub Title (in English)  
Keyword(1) Double Patterning  
Keyword(2) SADP  
Keyword(3) Cut Process  
Keyword(4) SADP-Cut  
Keyword(5) Grid Routing  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Hatsuhiko Miura  
1st Author's Affiliation Tokyo University of Agriculture and Technology (TUAT)
2nd Author's Name Mitsuru Hasegawa  
2nd Author's Affiliation Tokyo University of Agriculture and Technology (TUAT)
3rd Author's Name Kunihiro Fujiyoshi  
3rd Author's Affiliation Tokyo University of Agriculture and Technology (TUAT)
4th Author's Name  
4th Author's Affiliation ()
5th Author's Name  
5th Author's Affiliation ()
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-1 
Date Time 2016-11-29 11:20:00 
Presentation Time 25 minutes 
Registration for VLD 
Paper # VLD2016-58, DC2016-52 
Volume (vol) vol.116 
Number (no) no.330(VLD), no.331(DC) 
Page pp.85-90 
#Pages 6 
Date of Issue 2016-11-21 (VLD, DC) 

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan