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Paper Abstract and Keywords
Presentation 2016-11-29 09:00
Measurement of Vth Variation due to STI Stress and Inverse Narrow Channel Effect at Ultra-Low Voltage in a Variability-Suppressed Process
Yasuhiro Ogasahara, Hanpei Koike (AIST) CPM2016-76 ICD2016-37 IE2016-71
Abstract (in Japanese) (See Japanese page) 
(in English) This paper demonstrates notable impact of Vth shift due to STI-induced dopant redistribution on ultra-low voltage designs. 2.5X Ion change at ultra-low voltages due to STI was measured on a 65nm SOTB CMOS process. Serious 6X Ion change due to inverse narrow channel effects was also observed. We propose ring oscillator based measurement procedure observing Vth shift by exploiting flexible Vth controllability by backgate biasing of SOTB process.
Keyword (in Japanese) (See Japanese page) 
(in English) FD-SOI / SOTB / process variability / STI stress effect / inverese narrow channel effect / ultra-low voltage circuits / /  
Reference Info. IEICE Tech. Rep., vol. 116, no. 334, ICD2016-37, pp. 1-6, Nov. 2016.
Paper # ICD2016-37 
Date of Issue 2016-11-22 (CPM, ICD, IE) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2016-76 ICD2016-37 IE2016-71

Conference Information
Committee VLD DC CPSY RECONF CPM ICD IE  
Conference Date 2016-11-28 - 2016-11-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Ritsumeikan University, Osaka Ibaraki Campus 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Gaia 2016 -New Field of VLSI Design- 
Paper Information
Registration To ICD 
Conference Code 2016-11-VLD-DC-CPSY-RECONF-CPM-ICD-IE 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Measurement of Vth Variation due to STI Stress and Inverse Narrow Channel Effect at Ultra-Low Voltage in a Variability-Suppressed Process 
Sub Title (in English)  
Keyword(1) FD-SOI  
Keyword(2) SOTB  
Keyword(3) process variability  
Keyword(4) STI stress effect  
Keyword(5) inverese narrow channel effect  
Keyword(6) ultra-low voltage circuits  
Keyword(7)  
Keyword(8)  
1st Author's Name Yasuhiro Ogasahara  
1st Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
2nd Author's Name Hanpei Koike  
2nd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
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Speaker Author-1 
Date Time 2016-11-29 09:00:00 
Presentation Time 25 minutes 
Registration for ICD 
Paper # CPM2016-76, ICD2016-37, IE2016-71 
Volume (vol) vol.116 
Number (no) no.333(CPM), no.334(ICD), no.335(IE) 
Page pp.1-6 
#Pages 6 
Date of Issue 2016-11-22 (CPM, ICD, IE) 

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