| Paper Abstract and Keywords |
| Presentation |
2016-12-08 14:15
Effects of Fabrication Variation on the Performance of Silicon Waveguide Devices
Tsuyoshi Horikawa (PETRA/AIST), Daisuke Shimura, Jun Ushida, Yohei Sobu, Akemi Shiina, Masatoshi Tokushima, Seok-Hwan Jeong, Keizo Kinoshita, Tohru Mogami (PETRA) |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Silicon photonics has been expected as a key technology which is enable to integrate functionalities in a single chip for optical transceivers. In order to assure the reproducibility of optical circuit performance, it is a critical to reduce the variation of effective refractive index in various waveguide devices due to fabrication processes. In this study, by using an automatic wafer-level optical probing system, the experimental results of performance variations in passive devices of wire-waveguides, microring resonators, and grating couplers, which were fabricated by using highly-uniform 300-mm SOI wafers and high-resolution ArF immersion lithography. On the basis of the results, we discuss the effects of fabrication variation on device reproducibility. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
silicon photonics / optical integrated circuits / ArF immersion lithography / wire-waveguides / microring resonators / grating couplers / wafer-level optical probing system / fabrication variation |
| Reference Info. |
IEICE Tech. Rep. |
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