| Paper Abstract and Keywords |
| Presentation |
2016-12-12 14:15
Effect of Surface Treatment in Au/Ni Schottky Diodes Formed on Cleaved m-Plane Surfaces of Free-Standing n-GaN Sub-strates Kenji Shiojima, Moe Naganawa (Univ. of Fukui), Tomoyoshi Mishima (Hosei Univ.) ED2016-60 CPM2016-93 LQE2016-76 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
We fabricated and characterized Au/Ni Schottky contacts on cleaved m-plane free-standing n-GaN surfaces (i) without any surface treatment, (ii) with H2O2 treatment, or (iii) with HCl treatment. The as-cleaved samples showed I-V characteristics with small n-values and less diode-to-diode variation. However, the H2O2 samples had much smaller Schottky barrier height. Whereas the HCl samples exhibited significantly large diode-to-diode variation. It is confirmed that cleaving without any surface treatment can provide a cleaner surface to form Schottky diodes on m-plane n-GaN surfaces than that with conventional HCl treatment. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
m-plane GaN / cleaving / surface treatment / Schottky contact / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 116, no. 356, ED2016-60, pp. 15-20, Dec. 2016. |
| Paper # |
ED2016-60 |
| Date of Issue |
2016-12-05 (ED, CPM, LQE) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ED2016-60 CPM2016-93 LQE2016-76 |
| Conference Information |
| Committee |
CPM LQE ED |
| Conference Date |
2016-12-12 - 2016-12-13 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Kyoto University |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Nitride semiconductors, optoelectronic devices, and related materials |
| Paper Information |
| Registration To |
ED |
| Conference Code |
2016-12-CPM-LQE-ED |
| Language |
English (Japanese title is available) |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Effect of Surface Treatment in Au/Ni Schottky Diodes Formed on Cleaved m-Plane Surfaces of Free-Standing n-GaN Sub-strates |
| Sub Title (in English) |
* |
| Keyword(1) |
m-plane GaN |
| Keyword(2) |
cleaving |
| Keyword(3) |
surface treatment |
| Keyword(4) |
Schottky contact |
| Keyword(5) |
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| 1st Author's Name |
Kenji Shiojima |
| 1st Author's Affiliation |
University of Fukui (Univ. of Fukui) |
| 2nd Author's Name |
Moe Naganawa |
| 2nd Author's Affiliation |
University of Fukui (Univ. of Fukui) |
| 3rd Author's Name |
Tomoyoshi Mishima |
| 3rd Author's Affiliation |
Hosei University (Hosei Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2016-12-12 14:15:00 |
| Presentation Time |
25 minutes |
| Registration for |
ED |
| Paper # |
ED2016-60, CPM2016-93, LQE2016-76 |
| Volume (vol) |
vol.116 |
| Number (no) |
no.356(ED), no.357(CPM), no.358(LQE) |
| Page |
pp.15-20 |
| #Pages |
6 |
| Date of Issue |
2016-12-05 (ED, CPM, LQE) |